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Temperature-reduced nanoimprint lithography for thin and uniform residual layers
N. Bogdanski, M. Wissen, A. Ziegler, H.-C. ScheerVolume:
78-79
Year:
2005
Language:
english
Pages:
7
DOI:
10.1016/j.mee.2004.12.076
File:
PDF, 371 KB
english, 2005