Influence of the sidewall diffusion barrier on the...

Microelectronic Engineering 2005 Vol. 82; Iss. 3-4

Influence of the sidewall diffusion barrier on the transport properties of advanced Cu/low-k interconnects

Cyril Guedj, Jean-Frédéric Guillaumond, Lucile Arnaud, Vincent Arnal, Mohamed Aimadeddine, Gilles Reimbold, Joaquin Torres
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Volume:
82
Year:
2005
Language:
english
Pages:
6
DOI:
10.1016/j.mee.2005.07.019
File:
PDF, 442 KB
english, 2005
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