Development of new resist materials for 193-nm dry and immersion lithography
Yoko Takebe, Takashi Sasaki, Naoko Shirota, Osamu YokokojiVolume:
83
Year:
2006
Language:
english
Pages:
3
DOI:
10.1016/j.mee.2006.01.024
File:
PDF, 104 KB
english, 2006