Stress evolution during Ni–Si compound formation for fully silicided (FUSI) gates
C. Torregiani, C. Van Bockstael, C. Detavernier, C. Lavoie, A. Lauwers, K. Maex, J.A. KittlVolume:
84
Year:
2007
Language:
english
Pages:
4
DOI:
10.1016/j.mee.2007.05.054
File:
PDF, 367 KB
english, 2007