The influence of stamp deformation on residual layer homogeneity in thermal nanoimprint lithography
S. Merino, A. Retolaza, A. Juarros, H. SchiftVolume:
85
Year:
2008
Language:
english
Pages:
5
DOI:
10.1016/j.mee.2008.06.011
File:
PDF, 1.83 MB
english, 2008