Parallel angle resolved XPS investigations on...

Microelectronic Engineering 2008 Vol. 85; Iss. 9

Parallel angle resolved XPS investigations on 12 in. wafers for the study of W and WSix oxidation in air

B. Pelissier, A. Beaurain, J.P. Barnes, R. Gassilloud, F. Martin, O. Joubert
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Volume:
85
Year:
2008
Language:
english
Pages:
6
DOI:
10.1016/j.mee.2008.06.012
File:
PDF, 420 KB
english, 2008
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