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Experimental evidence of suppression on oxygen vacancy formation in Hf based high-κ gate dielectrics with La incorporation
Chun-Chang Lu, Kuei-Shu Chang-Liao, Yu-Fen Cheng, Tien-Ko WangVolume:
86
Year:
2009
Language:
english
Pages:
4
DOI:
10.1016/j.mee.2009.03.047
File:
PDF, 621 KB
english, 2009