Thin titanium oxide films deposited by e-beam evaporation with additional rapid thermal oxidation and annealing for ISFET applications
A.D. Barros, K.F. Albertin, J. Miyoshi, I. Doi, J.A. DinizVolume:
87
Year:
2010
Language:
english
Pages:
4
DOI:
10.1016/j.mee.2009.06.020
File:
PDF, 412 KB
english, 2010