Post Si(C)N hillock nucleation and growth in IC copper lines controlled by diffusional creep
A. Timma, P. Caubet, B. Chenevier, O. Thomas, B. Kaouache, L. Dumas, P. Normandon, J.C. GiraudinVolume:
87
Year:
2010
Language:
english
Pages:
4
DOI:
10.1016/j.mee.2009.08.003
File:
PDF, 927 KB
english, 2010