Simulation of focused ion beam etching by coupling a topography simulator and a Monte-Carlo sputtering yield simulator
D. Kunder, E. Baer, M. Sekowski, P. Pichler, M. RommelVolume:
87
Year:
2010
Language:
english
Pages:
3
DOI:
10.1016/j.mee.2009.11.007
File:
PDF, 354 KB
english, 2010