Direct e-beam writing of high aspect ratio nanostructures...

Direct e-beam writing of high aspect ratio nanostructures in PMMA: A tool for diffractive X-ray optics fabrication

Sergey Gorelick, Joan Vila-Comamala, Vitaliy Guzenko, Rajmund Mokso, Marco Stampanoni, Christian David
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Volume:
87
Year:
2010
Language:
english
Pages:
5
DOI:
10.1016/j.mee.2009.11.091
File:
PDF, 475 KB
english, 2010
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