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Study of the behaviour of monomers in thermal nanoimprint lithography
C. Gourgon, A. Béduer, S. Landis, C. Perret, N. Chaix, I. GereigeVolume:
87
Year:
2010
Language:
english
Pages:
5
DOI:
10.1016/j.mee.2009.11.101
File:
PDF, 392 KB
english, 2010