Influence of process parameters on hydrogen silsesquioxane...

Influence of process parameters on hydrogen silsesquioxane chemistry at low voltage electron beam exposures

David Rio, Laurent Siegert, Samir Derrough, Christophe Constancias, Béatrice Icard, Herman Meynen, Laurent Pain
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Volume:
87
Year:
2010
Language:
english
Pages:
4
DOI:
10.1016/j.mee.2009.12.003
File:
PDF, 386 KB
english, 2010
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