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Influence of process parameters on hydrogen silsesquioxane chemistry at low voltage electron beam exposures
David Rio, Laurent Siegert, Samir Derrough, Christophe Constancias, Béatrice Icard, Herman Meynen, Laurent PainVolume:
87
Year:
2010
Language:
english
Pages:
4
DOI:
10.1016/j.mee.2009.12.003
File:
PDF, 386 KB
english, 2010