Experiments and simulation of the diffusion and activation...

Microelectronic Engineering 2011 Vol. 88; Iss. 4

Experiments and simulation of the diffusion and activation of the n-type dopants P, As, and Sb implanted into germanium

S. Koffel, R.J. Kaiser, A.J. Bauer, B. Amon, P. Pichler, J. Lorenz, L. Frey, P. Scheiblin, V. Mazzocchi, J.-P. Barnes, A. Claverie
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
88
Year:
2011
Language:
english
Pages:
4
DOI:
10.1016/j.mee.2010.09.023
File:
PDF, 466 KB
english, 2011
Conversion to is in progress
Conversion to is failed