Chemical nature of the passivation layer depending on the oxidizing agent in Gd2O3/GeO2/Ge stacks grown by molecular beam deposition
A. Lamperti, S. Baldovino, A. Molle, M. FanciulliVolume:
88
Year:
2011
Language:
english
Pages:
4
DOI:
10.1016/j.mee.2010.10.029
File:
PDF, 620 KB
english, 2011