SiLK™ etch optimization and electrical characterization for...

Microelectronics Reliability 2005 Vol. 45; Iss. 3-4

SiLK™ etch optimization and electrical characterization for 0.13 μm interconnects

Ramana Murthy, Y.W. Chen, A. Krishnamoorthy, X.T. Chen
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
45
Year:
2005
Language:
english
Pages:
10
DOI:
10.1016/j.microrel.2004.06.005
File:
PDF, 985 KB
english, 2005
Conversion to is in progress
Conversion to is failed