Post deposition UV-induced O2 annealing of HfO2 thin films
Q. Fang, I. Liaw, M. Modreanu, P.K. Hurley, I.W. BoydVolume:
45
Year:
2005
Language:
english
Pages:
4
DOI:
10.1016/j.microrel.2004.11.017
File:
PDF, 115 KB
english, 2005