A direct measurement of electromigration induced drift velocity in Cu dual damascene interconnects
M.Y. Yan, K.N. Tu, A.V. Vairagar, S.G. Mhaisalkar, Ahila KrishnamoorthyVolume:
46
Year:
2006
Language:
english
Pages:
4
DOI:
10.1016/j.microrel.2005.11.004
File:
PDF, 221 KB
english, 2006