Residual stress in amorphous and nanocrystalline Si films prepared by PECVD with hydrogen dilution
Y.Q. Fu, J.K. Luo, S.B. Milne, A.J. Flewitt, W.I. MilneVolume:
124-125
Year:
2005
Language:
english
Pages:
6
DOI:
10.1016/j.mseb.2005.08.104
File:
PDF, 415 KB
english, 2005