Residual stress in amorphous and nanocrystalline Si films...

Residual stress in amorphous and nanocrystalline Si films prepared by PECVD with hydrogen dilution

Y.Q. Fu, J.K. Luo, S.B. Milne, A.J. Flewitt, W.I. Milne
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Volume:
124-125
Year:
2005
Language:
english
Pages:
6
DOI:
10.1016/j.mseb.2005.08.104
File:
PDF, 415 KB
english, 2005
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