Simulation of the sub-melt laser anneal process in 45 CMOS technology—Application to the thermal pattern effects
A. Colin, P. Morin, F. Cacho, H. Bono, R. Beneyton, M. Bidaud, D. Mathiot, E. FogarassyVolume:
154-155
Year:
2008
Language:
english
Pages:
4
DOI:
10.1016/j.mseb.2008.09.009
File:
PDF, 419 KB
english, 2008