A high throughput, ultra-low roughness, SiGe-free strained Si regrowth process
Christopher Leitz, Vicky Yang, Mark Carroll, Thomas Langdo, Richard Westhoff, Christopher Vineis, Mayank BulsaraVolume:
8
Year:
2005
Language:
english
Pages:
6
DOI:
10.1016/j.mssp.2004.09.071
File:
PDF, 296 KB
english, 2005