In Situ Etching of SiC Wafers in a CVD System Using Oxygen...

Materials Science Forum 2002 Vol. 389-393

In Situ Etching of SiC Wafers in a CVD System Using Oxygen as the Source

Wang, Rong Jun, Bhat, I., Chow, T.P.
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Volume:
389-393
Year:
2002
Journal:
Materials Science Forum
DOI:
10.4028/www.scientific.net/MSF.389-393.303
File:
PDF, 316 KB
2002
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