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Process Dependence on Defectivity Count on Copper and Dielectric Surfaces in Post-Copper CMP Cleaning
Daviot, Jerome, Vaes, JanVolume:
145-146
Year:
2009
Language:
english
Journal:
Solid State Phenomena
DOI:
10.4028/www.scientific.net/SSP.145-146.385
File:
PDF, 307 KB
english, 2009