Volume 145-146

Solid State Phenomena

Volume 145-146

1

Cu Dendrite Formation in Post Trench Etch Cleaning

Heo, Jung Shik, Oh, Jun Hwan, Shin, Hong Jae, Lee, Nae In

Journal:

Solid State Phenomena

Year:

2009

Language:

english

File:

PDF, 574 KB

english, 2009

2

Etch Rate Study of Germanium, GaAs and InGaAs: A Challenge in Semiconductor Processing

Sioncke, Sonja, Brunco, David P., Meuris, Marc, Uwamahoro, Olivier, Van Steenbergen, Jan, Vrancken, Evi, Heyns, Marc M.

Journal:

Solid State Phenomena

Year:

2009

Language:

english

File:

PDF, 268 KB

english, 2009

3

Silicon Surface Preparation and Passivation by Vapor Phase of Heavy Water

Pap, Andrea E., Nényei, Zsolt, Battistig, Gábor, Bársony, István

Journal:

Solid State Phenomena

Year:

2009

Language:

english

File:

PDF, 524 KB

english, 2009

4

Process Dependence on Defectivity Count on Copper and Dielectric Surfaces in Post-Copper CMP Cleaning

Daviot, Jerome, Vaes, Jan

Journal:

Solid State Phenomena

Year:

2009

Language:

english

File:

PDF, 307 KB

english, 2009

5

Evaluation of Plasma Strip Induced Substrate Damage

Han, Ke Ping, Luo, S., Escorcia, O., Waldfried, C., Berry, Ivan L.

Journal:

Solid State Phenomena

Year:

2009

Language:

english

File:

PDF, 243 KB

english, 2009

6

Molybdenum Contamination in Silicon: Detection and Impact on Device Performances

Codegoni, Davide, Polignano, Maria Luisa, Caputo, Daniele, Riva, Andrea, Blot, Emmanuel, Coulon, David, Maillot, Philippe, Pic, Nicolas

Journal:

Solid State Phenomena

Year:

2009

Language:

english

File:

PDF, 592 KB

english, 2009

7

Prevention of Condensation Defects on Contact Patterns by Improving Rinse Process

Oh, Jung Min, Han, Jeong Nam, Lee, Kun Tack, Hong, Chang Ki, Han, Woo Sung, Moon, Joo Tae, Park, Jin Goo

Journal:

Solid State Phenomena

Year:

2009

Language:

english

File:

PDF, 1.02 MB

english, 2009

8

Drying of High Aspect Ratio Structures: A Comparison of Drying Techniques via Electrical Stiction Analysis

Pacco, Antoine, Wada, Masayuki, Bearda, Twan, Mertens, Paul W.

Journal:

Solid State Phenomena

Year:

2009

Language:

english

File:

PDF, 336 KB

english, 2009

9

Defects of Silicon Substrates Caused by Electro-Static Discharge in Single Wafer Cleaning Process

Hagimoto, Yoshiya, Iwamoto, Hayato, Honbe, Yasushi, Fukunaga, Takuro, Abe, Hitoshi

Journal:

Solid State Phenomena

Year:

2009

Language:

english

File:

PDF, 376 KB

english, 2009

10

Material Loss Impact on Device Performance for 32nm CMOS and Beyond

Kirkpatrick, Brian K., Chambers, James J., Prins, Steven L., Riley, Deborah J., Xiong, Wei Ze, Wang, Xin

Journal:

Solid State Phenomena

Year:

2009

Language:

english

File:

PDF, 747 KB

english, 2009

11

Shortening of Plasma Strip Process Resulting in Better Removal of Photo Resist after High Dose Implantation

Zakharov, Andrey, Lenski, Markus, Metzger, Sven, Krüger, Christian

Journal:

Solid State Phenomena

Year:

2009

Language:

english

File:

PDF, 723 KB

english, 2009

12

Monitoring System for Airborne Molecular Contamination (AMC) in Semiconductor Manufacturing Areas and Micro-Environments

Otto, Michael, Leibold, Andreas, Wulf, Lars, Hurlebaus, Matthias, Pfitzner, Lothar

Journal:

Solid State Phenomena

Year:

2009

Language:

english

File:

PDF, 227 KB

english, 2009

13

Impact of CMP Polish and pCMP Cleaning on Adhesion of SiCN Capping Layer on PECVD-Derived Porous OSG and Copper

Gage, Dave M., Thiel, A.D.W., Dauskardt, R.H., Haas, M.K., Matz, L.M., O'Neill, M.L., Wieder, T.M., Banerjee, G., Rao, M.B.

Journal:

Solid State Phenomena

Year:

2009

Language:

english

File:

PDF, 344 KB

english, 2009

14

Cleaning Technique Using High-Speed Steam-Water Mixed Spray

Watanabe, Masao, Sanada, Toshiyuki, Hayashida, Atsushi, Isago, Yoichi

Journal:

Solid State Phenomena

Year:

2009

Language:

english

File:

PDF, 853 KB

english, 2009

15

A Novel Vapor Phase Etching Process for Si

Verhaverbeke, Steven

Journal:

Solid State Phenomena

Year:

2009

Language:

english

File:

PDF, 10.73 MB

english, 2009

16

Complementary Metrology within a European Joint Laboratory

Nutsch, Andreas, Beckhoff, Burkhard, Altmann, Roswitha, Van den Berg, J.A., Giubertoni, D., Hoenicke, Philipp, Bersani, M., Leibold, Andreas, Meirer, F., Müller, Matthias, Pepponi, G., Otto, Michael,

Journal:

Solid State Phenomena

Year:

2009

Language:

english

File:

PDF, 1.73 MB

english, 2009

17

Design and Development of Novel Remover for Cu/Porous Low-k Interconnects

Suzuki, Tomoko, Otake, Atsushi, Aoki, Tomoko

Journal:

Solid State Phenomena

Year:

2009

Language:

english

File:

PDF, 1.84 MB

english, 2009

18

Reduced Particle Removal Efficiency Upon Wafer Storage

Knotter, D. Martin, Roucou, Romuald, Peyrin, Rémi

Journal:

Solid State Phenomena

Year:

2009

Language:

english

File:

PDF, 628 KB

english, 2009

19

Preparation and Characterization of Self-Assembled Monolayers on Germanium Surfaces

Lommel, Martin, Hönicke, Philipp, Kolbe, Michael, Müller, Matthias, Reinhardt, Falk, Möbus, Pit, Mankel, Eric, Beckhoff, Burkhard, Kolbesen, Bernd O.

Journal:

Solid State Phenomena

Year:

2009

Language:

english

File:

PDF, 1.35 MB

english, 2009

20

Trace Metallic Contamination Analysis on Wafer Edge and Bevel by TXRF and VPD-TXRF

Takahara, Hikari, Tsugane, Ken

Journal:

Solid State Phenomena

Year:

2009

Language:

english

File:

PDF, 546 KB

english, 2009

21

Stripping and Cleaning of High-Dose Ion-Implanted Photoresists Using a Single-Wafer, Single-Chamber Dry/Wet Hybrid System

Kim, Y.J., Lee, J.H., Seo, K.J., Yoon, C.R., Roh, E.S., Cho, J.K., Hattori, T.

Journal:

Solid State Phenomena

Year:

2009

Language:

english

File:

PDF, 868 KB

english, 2009

22

Borderless via Clean Study for Minimizing Al-Cu Loss in 58nm Flash Devices

Chen, Cheng Kuen, Yu, Pi Chun, Lee, Ming Hsiu, Wu, Chih Ning, Matsuo, Hiroshi

Journal:

Solid State Phenomena

Year:

2009

Language:

english

File:

PDF, 1.22 MB

english, 2009

23

Cu Surface Characterization after Wet Cleaning Processes

Pipia, Francesco, Votta, Annamaria, Elbaz, Alice C., Grasso, Salvo, Ravizza, Enrica, Spadoni, S., Alessandri, Mauro

Journal:

Solid State Phenomena

Year:

2009

Language:

english

File:

PDF, 358 KB

english, 2009

24

Particle Retention Mechanism of Filter in High Temperature Chemical

Nagafuchi, Takuya, Chiba, Koji, Funahashi, Isamu, Inukai, Minako, Yamada, Hiroaki, Umezawa, Kaori, Tomita, Hiroshi

Journal:

Solid State Phenomena

Year:

2009

Language:

english

File:

PDF, 330 KB

english, 2009

25

Surface Energy and Wetting Behaviour of Plasma Etched Porous SiCOH Surfaces and Plasma Etch Residue Cleaning Solutions

Ahner, Nicole, Schaller, Matthias, Bartsch, Christin, Baryschpolec, Eugene, Schulz, Stefan E.

Journal:

Solid State Phenomena

Year:

2009

Language:

english

File:

PDF, 283 KB

english, 2009

26

The Influence of Standing Waves on Cleaning with a Megasonic Nozzle

Janssens, Tom, Doumen, G., Halder, S., Wostyn, Kurt, Mertens, Paul W., Straka, Joachim

Journal:

Solid State Phenomena

Year:

2009

Language:

english

File:

PDF, 309 KB

english, 2009

27

Highly Sensitive Detection of Inorganic Contamination

Beckhoff, Burkhard, Nutsch, Andreas, Altmann, Roswitha, Borionetti, G., Pello, C., Polignano, Maria Luisa, Codegoni, Davide, Grasso, Salvo, Cazzini, Elena, Bersani, M., Lazzeri, P., Gennaro, S., Kolbe

Journal:

Solid State Phenomena

Year:

2009

Language:

english

File:

PDF, 344 KB

english, 2009

28

Reduction of Airborne Molecular Contamination on 300 mm Front Opening Unified POD (FOUP) and Wafers Surface by Vacuum Technology

Maquin, Philippe, Kambara, Hisanori

Journal:

Solid State Phenomena

Year:

2009

Language:

english

File:

PDF, 918 KB

english, 2009

29

Improving Process Control for Copper Electroplating through Filter Membrane Optimization

Wu, Ai Wen, Cornner, Gregg, Prabhaker, Vinay

Journal:

Solid State Phenomena

Year:

2009

Language:

english

File:

PDF, 488 KB

english, 2009

30

Surface Texturization and Interface Passivation of Mono-Crystalline Silicon Substrates by Wet Chemical Treatments

Sievert, W., Zimmermann, K.U., Hartmann, B., Klimm, C., Jacob, K., Angermann, H.

Journal:

Solid State Phenomena

Year:

2009

Language:

english

File:

PDF, 5.75 MB

english, 2009

31

Chemical and Mechanical Analysis of HDIS Residues Using Auger Electron Spectroscopy and Nanoindentation

Kadavanich, Andreas V., Shim, Sang Hoon, Meyer, Harry M., Savas, Stephen E., Lara-Curzio, Edgar

Journal:

Solid State Phenomena

Year:

2009

Language:

english

File:

PDF, 343 KB

english, 2009

32

Impact of Galvanic Corrosion on Metal Gate Stacks

Wada, Masayuki, Garaud, Sylvain, Ferain, I., Collaert, Nadine, Sano, Kenichi, Snow, James, Vos, Rita, Leunissens, L.H.A., Mertens, Paul W., Eitoku, Atsuro

Journal:

Solid State Phenomena

Year:

2009

Language:

english

File:

PDF, 1.07 MB

english, 2009

33

Surface Potential Difference Imaging Applied to Wet Clean Monitoring

Danel, Adrien, Sage, S., Roure, M.C., Peters, D., Hawthorne, Jeff, Spicer, R.

Journal:

Solid State Phenomena

Year:

2009

Language:

english

File:

PDF, 1.85 MB

english, 2009

34

Particle – Wafer Interactions in Semiaqueous Silicon Cleaning Systems

Hupka, Lukasz, Nalaskowski, Jakub, Sinha, Nishant, Greeley, Joseph N., Clark, Zak, Du, Hao, Johnson, William P., Miller, Jan D.

Journal:

Solid State Phenomena

Year:

2009

Language:

english

File:

PDF, 2.41 MB

english, 2009

35

Characterization of a Cavitation Bubble Structure at 230 kHz: Bubble Population, Sonoluminescence and Cleaning Potential

Otto, Andrea, Nowak, Till, Mettin, Robert, Holsteyns, Frank, Lippert, Alexander

Journal:

Solid State Phenomena

Year:

2009

Language:

english

File:

PDF, 1.14 MB

english, 2009

36

Surface Preparation and Passivation of III-V Substrates for Future Ultra-High Speed, Low Power Logic Applications

Rachmady, Willy, Blackwell, James, Dewey, Gilbert, Hudait, Mantu, Radosavljevic, Marko, Turkot Jr., Robert, Chau, Robert

Journal:

Solid State Phenomena

Year:

2009

Language:

english

File:

PDF, 331 KB

english, 2009

37

Novel Methods for Wet Stripping High Dose Implanted Photoresist Using Sulfur Trioxide

Bergman, Eric J., Leonhard, J. Dusty

Journal:

Solid State Phenomena

Year:

2009

Language:

english

File:

PDF, 282 KB

english, 2009

38

Electrochemical Behavior of Cobalt in Post-Via Etch Cleaning Solutions

Bilouk, Sabrina, Pernel, Carole, Broussous, Lucile, Ivanova, Valentina, Nogueira, Ricardo

Journal:

Solid State Phenomena

Year:

2009

Language:

english

File:

PDF, 1.31 MB

english, 2009

39

Stripping of Ion Implanted Photoresist by CO2 Cryogenic Pre-Treatment Followed by Wet Cleaning

Malhouitre, Stéphane, Vos, Rita, Banerjee, Souvik, Cheng, Paul, Bearda, Twan, Mertens, Paul W.

Journal:

Solid State Phenomena

Year:

2009

Language:

english

File:

PDF, 2.26 MB

english, 2009

40

Impact of Dry Etch and Ash Conditions on Removability of Plasma Etch Residues in Al-Metallization. Approach to Improve PER Cleaning Efficiency by EHS-Friendly Aqueous Remover

Ferstl, Berthold, Klipp, Andreas, Essig, Manfred, Heidenblut, Maria

Journal:

Solid State Phenomena

Year:

2009

Language:

english

File:

PDF, 607 KB

english, 2009

41

Influence of Dry Ashing and Wet Treatments on NVM Metal Gate Structures

Elbaz, Alice C., Bellandi, Enrico, De Marco, Cinzia, Avaro, Luigi M., Ravizza, Enrica, Piva, Roberta, Alessandri, Mauro

Journal:

Solid State Phenomena

Year:

2009

Language:

english

File:

PDF, 547 KB

english, 2009

42

Poly-Silicon Etch with Diluted Ammonia: Application to Replacement Gate Integration Scheme

Sebai, Farid, Del Agua Borniquel, Jose Ignacio, Vos, Rita, Absil, Philippe, Chiarella, Thomas, Vrancken, Christa, Boelen, Pieter, Baiya, Evans

Journal:

Solid State Phenomena

Year:

2009

Language:

english

File:

PDF, 349 KB

english, 2009

43

A Novel Copper Interconnection Cleaning by Atomic Hydrogen Using Diluted Hydrogen Gas

Abe, Kazuki, Izumi, Akira

Journal:

Solid State Phenomena

Year:

2009

Language:

english

File:

PDF, 2.03 MB

english, 2009

44

Study of the Volatile Organic Contaminants Absorption and their Reversible Outgassing by FOUPs

Fontaine, Hervé, Cetre, Sylviane, Veillerot, Marc, Danel, Adrien

Journal:

Solid State Phenomena

Year:

2009

Language:

english

File:

PDF, 280 KB

english, 2009

45

Low Temperature Pre-Epi Treatment: Critical Parameters to Control Interface Contamination

Loo, Roger, Hikavyy, Andriy, Leys, Frederik E., Wada, Masayuki, Sano, Kenichi, De Vos, Brecht, Pacco, Antoine, Bargallo Gonzalez, Mireia, Simoen, Eddy, Verheyen, Peter, Vanherle, Wendy, Caymax, Matty

Journal:

Solid State Phenomena

Year:

2009

Language:

english

File:

PDF, 320 KB

english, 2009

46

Effect of Wet Treatment on Stability of Spin-On Dielectrics for STI Gap-Filling in Nanoscale Memory

Kim, Gyu Hyun, Park, Soon Young, Pyo, Seung Seok, Han, Ji Hye, Kim, Jung Nam, Oh, Kee Joon, Ryu, Choon Kun, Choi, Yong Soo, Kwak, Noh Jung, Park, Sung Ki

Journal:

Solid State Phenomena

Year:

2009

Language:

english

File:

PDF, 410 KB

english, 2009

47

Application of Single-Wafer Wet Cleaning Prior to Epitaxial SiGe Process

Sano, Kenichi, Wada, Masayuki, Leys, Frederik E., Loo, Roger, Hikavyy, Andriy, Mertens, Paul W., Snow, James, Izumi, Akira, Miya, Katsuhiko, Eitoku, Atsuro

Journal:

Solid State Phenomena

Year:

2009

Language:

english

File:

PDF, 338 KB

english, 2009

48

Impact of Metal-Ion Contaminated Silica Particles on Gate Oxide Integrity

Rink, Ingrid, Wali, Faisal, Knotter, D. Martin

Journal:

Solid State Phenomena

Year:

2009

Language:

english

File:

PDF, 999 KB

english, 2009

49

Influence of Wet Cleaning on Tungsten Deposited with Different Techniques

Votta, Annamaria, Pipia, Francesco, Borsari, S., Ravizza, Enrica, Elbaz, Alice C., Alessandri, Mauro, Bellandi, Enrico, Bresolin, C.

Journal:

Solid State Phenomena

Year:

2009

Language:

english

File:

PDF, 1.17 MB

english, 2009

50

Removal of Nano-Particles by Aerosol Spray: Effect of Droplet Size and Velocity on Cleaning Performance

Xu, K., Pichler, S., Wostyn, Kurt, Cado, G., Springer, C., Gale, Glenn W., Dalmer, Michael, Mertens, Paul W., Bearda, Twan, Gaulhofer, E., Podlesnik, D.

Journal:

Solid State Phenomena

Year:

2009

Language:

english

File:

PDF, 328 KB

english, 2009

51

Advances in Test Wafer Reclaim Technology – Wet Stripping Porous Low-k Films with No Substrate Damage

Robson, Mark, Fletcher, Kristin A., Jiang, Ping, Korzenski, M.B., Upham, A., Haigh Jr., T., Hsieh, Thomas J.C.

Journal:

Solid State Phenomena

Year:

2009

Language:

english

File:

PDF, 2.37 MB

english, 2009

52

Developing a High Volume Manufacturing Wet Clean Process to Remove BF2 Implant Induced Molybdenum Contamination

Sehgal, Akshey, Huang, Hsin Hsiung, Ramdani, Jamal, Klatt, Jeffrey, Printy, Craig, Ruby, Scott, Thibeault, Todd

Journal:

Solid State Phenomena

Year:

2009

Language:

english

File:

PDF, 424 KB

english, 2009

53

Photoresist Adhesion during Wet Etch on Single Wafer Tool

Garnier, Philippe, Pernet, B., Gomez, Y., Duluard, C., Torres, Alphonse, Barge, David, Gatefait, M., Lévy, Didier

Journal:

Solid State Phenomena

Year:

2009

Language:

english

File:

PDF, 688 KB

english, 2009

54

Cleanliness Management in Advanced Microelectronic

Borde, Yannick, Danel, Adrien, Roche, A., Fontaine, Hervé, Brych, C.

Journal:

Solid State Phenomena

Year:

2009

Language:

english

File:

PDF, 330 KB

english, 2009

55

Photoresist Removal Using Alternative Chemistries and Pressures

Song, In Gu, Timmons, Christopher, Levitin, Galit, Hess, Dennis W.

Journal:

Solid State Phenomena

Year:

2009

Language:

english

File:

PDF, 729 KB

english, 2009

56

Applications of Electrostatic Spray Techniques to Surface Cleaning

Finster, Ken, Small, Robert, Belz, Andrea, Mahoney, John, Perel, Julius, Gong, Jian

Journal:

Solid State Phenomena

Year:

2009

Language:

english

File:

PDF, 420 KB

english, 2009

57

High Speed Imaging of 1 MHz Driven Microbubbles in Contact with a Rigid Wall

Zijlstra, Aaldert, Janssens, Tom, Wostyn, Kurt, Versluis, Michel, Mertens, Paul W., Lohse, Detlef

Journal:

Solid State Phenomena

Year:

2009

Language:

english

File:

PDF, 570 KB

english, 2009

58

Characterization of Post Etch Residues Depending on Resist Removal Processes after Aluminum Etch

Heidenblut, Maria, Sturm, D., Lechner, Alfred, Faupel, Franz

Journal:

Solid State Phenomena

Year:

2009

Language:

english

File:

PDF, 548 KB

english, 2009

59

Three-Step Room Temperature Wet Cleaning Process for Silicon Substrate

Hasebe, Rui, Teramoto, Akinobu, Suwa, Tomoyuki, Kuroda, Rihito, Sugawa, Shigetoshi, Ohmi, Tadahiro

Journal:

Solid State Phenomena

Year:

2009

Language:

english

File:

PDF, 316 KB

english, 2009

60

Local Distribution of Particles Deposited on Patterned Surfaces

Wali, Faisal, Knotter, D. Martin, Bearda, Twan, Mertens, Paul W.

Journal:

Solid State Phenomena

Year:

2009

Language:

english

File:

PDF, 510 KB

english, 2009

61

Recyclable Fluorine-Based Cleaning Solvents for Resist Removal

Okamoto, Hidekazu, Namatsu, Hideo

Journal:

Solid State Phenomena

Year:

2009

Language:

english

File:

PDF, 337 KB

english, 2009

62

Metallic Contamination Control in Leading-Edge ULSI Manufacturing

Shimazaki, Ayako, Sakurai, Hiroki, Iwase, Masao, Yoshimura, Reiko, Tada, Tsukasa

Journal:

Solid State Phenomena

Year:

2009

Language:

english

File:

PDF, 792 KB

english, 2009

63

Megasonic Sweeping and Silicon Wafer Cleaning

Goodson, J.M., Nagarajan, R.

Journal:

Solid State Phenomena

Year:

2009

Language:

english

File:

PDF, 729 KB

english, 2009

64

The Interaction of Sublimed Iminodiacetic Acid with a Cu{110} Surface

Tee, D., Francis, S.M., Richardson, N.V., Reid, Chris, McGhee, Larry

Journal:

Solid State Phenomena

Year:

2009

Language:

english

File:

PDF, 2.64 MB

english, 2009

65

Co-Solvent Effect on the HF/CO2 Dry Etching of Sacrificial Oxides

Bae, Jae Hyun, Jung, Jae Mok, Lim, Kwon Taek

Journal:

Solid State Phenomena

Year:

2009

Language:

english

File:

PDF, 359 KB

english, 2009

66

Mechanism of Plasma-Less Gaseous Etching Process for Damaged Oxides from the Ion Implantation Process

Saito, Suguru, Hagimoto, Yoshiya, Iwamoto, Hayato, Muraki, Yusuke

Journal:

Solid State Phenomena

Year:

2009

Language:

english

File:

PDF, 279 KB

english, 2009

67

Current Advances in Anhydrous HF/Organic Solvent Processing of Semiconductor Surfaces

Roman, P., Torek, K., Shanmugasundaram, K., Mumbauer, P., Vestyk, D., Hammond, P., Ruzyllo, J.

Journal:

Solid State Phenomena

Year:

2009

Language:

english

File:

PDF, 901 KB

english, 2009

68

Post Ion-Implant Photoresist Stripping Using Steam and Water: Pre-Treatment in a Steam Atmosphere and Steam-Water Mixed Spray

Sanada, Toshiyuki, Watanabe, Masao, Hayashida, Atsushi, Isago, Yoichi

Journal:

Solid State Phenomena

Year:

2009

Language:

english

File:

PDF, 2.37 MB

english, 2009

69

Porous Low-k Wet Etch in HF-Based Solutions: Focus on Cleaning Process Window, "Pore-Sealing" and "k Recovery"

Broussous, Lucile, Puyrenier, W., Rebiscoul, D., Rouessac, V., Ayral, A.

Journal:

Solid State Phenomena

Year:

2009

Language:

english

File:

PDF, 1.59 MB

english, 2009

70

Modification of Photoresist by UV for Post-Etch Wet Strip Applications

Le, Quoc Toan, Kesters, E., Prager, L., Claes, Martine, Lux, Marcel, Vereecke, Guy

Journal:

Solid State Phenomena

Year:

2009

Language:

english

File:

PDF, 719 KB

english, 2009

71

The Effect of PVA Brush Scrubbing on Post CMP Cleaning Process for Damascene Cu Interconnection

Cho, Han Chul, Kim, Young Min, Lee, Hyun Seop, Joo, Suk Bae, Jeong, Hae Do

Journal:

Solid State Phenomena

Year:

2009

Language:

english

File:

PDF, 410 KB

english, 2009

72

Analyzing the Collapse Force of Narrow Lines Measured by Lateral Force AFM Using an Analytical Mechanical Model

Wostyn, Kurt, Kim, Tae Gon, Mertens, Paul W., Park, Jin Goo

Journal:

Solid State Phenomena

Year:

2009

Language:

english

File:

PDF, 329 KB

english, 2009

73

High Aspect Ratio Contact Clean Study in 58nm Flash Device

Yu, Pi Chun, Chen, Cheng Kuen, Lin, Jin Lang, Wu, Chih Ning, Matsuo, Hiroshi

Journal:

Solid State Phenomena

Year:

2009

Language:

english

File:

PDF, 1.65 MB

english, 2009

74

Effect of Various Cleaning Solutions and Brush Scrubber Kinematics on the Frictional Attributes of Post Copper CMP Cleaning Process

Sampurno, Yasa, Zhuang, Yun, Gu, Xun, Theng, Sian, Nemoto, Takenao, Sun, Ting, Sudargho, Fransisca, Teramoto, Akinobu, Philipossian, Ara, Ohmi, Tadahiro

Journal:

Solid State Phenomena

Year:

2009

Language:

english

File:

PDF, 1.11 MB

english, 2009

75

Damage-Free Post-CMP Cleaning Solution for Low-k Fluorocarbon on Advanced Interconnects

Gu, Xun, Nemoto, Takenao, Teramoto, Akinobu, Hasebe, Rui, Ito, Takashi, Ohmi, Tadahiro

Journal:

Solid State Phenomena

Year:

2009

Language:

english

File:

PDF, 3.30 MB

english, 2009

76

Impact of Megasonic Activation with Different Chemistries on Silicon Surface in Single Wafer Tool

Briend, Guillaume, Besson, Pascal, Salvetat, Thierry, Petitdidier, Sébastien

Journal:

Solid State Phenomena

Year:

2009

Language:

english

File:

PDF, 748 KB

english, 2009

77

Single Wafer Ozone-Based Processing for Effective Edge Fluoropolymer Cleaning

Niccoli, John, Cogrono, Matt, Eastlack, Michelle, McCane, Dave, Carlson, Craig, Young, Erik, Chapek, Dave

Journal:

Solid State Phenomena

Year:

2009

Language:

english

File:

PDF, 531 KB

english, 2009

78

Impacts of Ionization Potentials and Megasonic Dispersion

Journal:

Solid State Phenomena

Year:

2009

Language:

english

File:

PDF, 461 KB

english, 2009

79

Advances on 45nm SiGe-Compatible NiPt Salicide Process

Chen, Yi Wei, Ho, Nien Ting, Lai, Jerander, Tsai, T.C., Huang, C.C., Tzou, S.F., Chu, James M.M.

Journal:

Solid State Phenomena

Year:

2009

Language:

english

File:

PDF, 427 KB

english, 2009

80

Direct Observation of Single Bubble Cavitation Damage for MHz Cleaning

Tomita, Hiroshi, Inukai, Minako, Umezawa, Kaori, Ji, Li Nan

Journal:

Solid State Phenomena

Year:

2009

Language:

english

File:

PDF, 1.27 MB

english, 2009

81

Ozone Chemistry for BEOL Resist Stripping – A Systematic Analytical Attempt to Understand the Interaction of O3 with Modern DUV-Resists

Guder, Mathias, Pellowska, Maren, Pohland, Maximilian, Dalmer, Michael, Kolbesen, Bernd O.

Journal:

Solid State Phenomena

Year:

2009

Language:

english

File:

PDF, 527 KB

english, 2009

82

Pattern Collapse and Particle Removal Forces of Interest to Semiconductor Fabrication Process

Kim, Tae Gon, Wostyn, Kurt, Park, Jin Goo, Mertens, Paul W., Busnaina, Ahmed A.

Journal:

Solid State Phenomena

Year:

2009

Language:

english

File:

PDF, 2.92 MB

english, 2009

83

Relationship between Atmospheric Humidity and Watermark Formation in IPA Dry of Si Wafer after HF Clean

Kurumoto, N., Eitoku, Atsuro, Miya, Katsuhiko

Journal:

Solid State Phenomena

Year:

2009

Language:

english

File:

PDF, 2.25 MB

english, 2009

84

Post Extension Ion Implant Photo Resist Strip for 32 nm Technology and beyond

Mannaert, G., Witters, L., Shamiryan, Denis, Boullart, Werner, Han, K., Luo, S., Falepin, A., Sonnemans, R., Berry, Ivan L., Waldfried, C.

Journal:

Solid State Phenomena

Year:

2009

Language:

english

File:

PDF, 1.01 MB

english, 2009

85

Steam-Injected SPM Process for All-Wet Stripping of Implanted Photoresist

DeKraker, David, Pasker, Blake, Butterbaugh, Jeffery W., Christenson, Kurt K., Wagener, Thomas J.

Journal:

Solid State Phenomena

Year:

2009

Language:

english

File:

PDF, 258 KB

english, 2009

86

High Velocity Aerosol Cleaning with Organic Solvents: Particle Removal and Substrate Damage

Andreas, Michael T., Wostyn, Kurt, Wada, Masayuki, Janssens, Tom, Kenis, Karine, Bearda, Twan, Mertens, Paul W.

Journal:

Solid State Phenomena

Year:

2009

Language:

english

File:

PDF, 1.05 MB

english, 2009

87

All Wet Photoresist Strip by Solvent Aerosol Spray

Wada, Masayuki, Sano, Kenichi, Snow, James, Vos, Rita, Leunissens, L.H.A., Mertens, Paul W., Eitoku, Atsuro

Journal:

Solid State Phenomena

Year:

2009

Language:

english

File:

PDF, 711 KB

english, 2009

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