Characterisation of HfO2/Si/SiC MOS Capacitors

Materials Science Forum 2011 / 3 Vol. 679-680

Characterisation of HfO2/Si/SiC MOS Capacitors

Gammon, Peter M., Pérez-Tomás, Amador, Jennings, Michael R., Guy, Owen J., Rimmer, N., Llobet, J., Mestres, Narcis, Godignon, Phillippe, Placidi, Marcel, Zabala, M., Covington, James A., Mawby, Philip
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Volume:
679-680
Language:
english
Journal:
Materials Science Forum
DOI:
10.4028/www.scientific.net/MSF.679-680.674
Date:
March, 2011
File:
PDF, 902 KB
english, 2011
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