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Shortening of Plasma Strip Process Resulting in Better Removal of Photo Resist after High Dose Implantation
Zakharov, Andrey, Lenski, Markus, Metzger, Sven, Krüger, ChristianVolume:
145-146
Year:
2009
Language:
english
Journal:
Solid State Phenomena
DOI:
10.4028/www.scientific.net/SSP.145-146.265
File:
PDF, 723 KB
english, 2009