Shortening of Plasma Strip Process Resulting in Better...

Shortening of Plasma Strip Process Resulting in Better Removal of Photo Resist after High Dose Implantation

Zakharov, Andrey, Lenski, Markus, Metzger, Sven, Krüger, Christian
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Volume:
145-146
Year:
2009
Language:
english
Journal:
Solid State Phenomena
DOI:
10.4028/www.scientific.net/SSP.145-146.265
File:
PDF, 723 KB
english, 2009
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