CMOS integration of epitaxial Gd2O3 high-k gate dielectrics

Solid-State Electronics 2006 Vol. 50; Iss. 6

CMOS integration of epitaxial Gd2O3 high-k gate dielectrics

H.D.B. Gottlob, T. Echtermeyer, T. Mollenhauer, J.K. Efavi, M. Schmidt, T. Wahlbrink, M.C. Lemme, H. Kurz, M. Czernohorsky, E. Bugiel, H.-J. Osten, A. Fissel
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Volume:
50
Year:
2006
Language:
english
Pages:
7
DOI:
10.1016/j.sse.2006.04.018
File:
PDF, 433 KB
english, 2006
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