Chemical Processing and Materials Compatibility of High-K...

Solid State Phenomena 2001 Vol. 76-77

Chemical Processing and Materials Compatibility of High-K Dielectric Materials for Advanced Gate Stacks

Guan, J.J., Gale, Glenn W., Bersuker, G., Jackson, M., Huff, Howard R.
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Volume:
76-77
Year:
2001
Journal:
Solid State Phenomena
DOI:
10.4028/www.scientific.net/SSP.76-77.19
File:
PDF, 333 KB
2001
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