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Volume 76-77
Main
Solid State Phenomena
Volume 76-77
Solid State Phenomena
Volume 76-77
1
Optimisations of SC-1 Conditions for Sub 0.18μm Technologies in an Industrial Environment
Petitdidier, Sébastien
,
Bernard, H.
,
Bellandi, Enrico
,
Landa, F.
,
Shirakawa, H.
,
Lévy, Didier
Journal:
Solid State Phenomena
Year:
2001
File:
PDF, 340 KB
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2001
2
Post SiN Etching Cleaning During Copper and Low K Integration
Beverina, Alessio
,
Louis, Didier
,
Arvet, C.
,
Lajoinie, E.
,
Besson, Pascal
,
Peyne, C.
,
Holmes, Douglas
,
Maloney, D.
,
Lee, S.
,
Lee, W.M.
Journal:
Solid State Phenomena
Year:
2001
File:
PDF, 376 KB
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2001
3
Particle Removal Efficiency Evaluation at 40 nm Using Haze Particle Standard
Yoo, Seong Ho
,
Liu, Benjamin Y.H.
,
Sun, James
,
Narayanswami, Natraj
,
Thomes, Gregory P.
Journal:
Solid State Phenomena
Year:
2001
File:
PDF, 334 KB
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2001
4
The Ozone Solubility and its Decay in Aqueous Solutions: Crucial Issues in Ozonated Chemistries for Semiconductor Cleaning
De Smedt, F.
,
De Gendt, Stefan
,
Heyns, Marc M.
,
Vinckier, Chris
Journal:
Solid State Phenomena
Year:
2001
File:
PDF, 260 KB
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2001
5
Detection and Identification of Organic Contamination on Silicon Substrates
Roche, A.
,
Marthon, S.
,
Ple, J.F.
,
Rochat, Névine
,
Danel, Adrien
,
Olivier, M.
,
Juhel, M.
,
Tardif, F.
Journal:
Solid State Phenomena
Year:
2001
File:
PDF, 358 KB
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2001
6
Investigation of Trace Metals Analyses of Dry Residue on Silicon Wafer Surfaces by TXRF and ICP-MS
Wang, Jiang Bo
,
Balazs, M.
,
Pianetta, Piero
,
Baur, K.
,
Brennan, S.
Journal:
Solid State Phenomena
Year:
2001
File:
PDF, 360 KB
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2001
7
Silicon Surface Cleaning after Spacer Dry Etching
Shamiryan, Denis
,
Baklanov, Mikhail R.
,
Vanhaelemeersch, Serge
Journal:
Solid State Phenomena
Year:
2001
File:
PDF, 304 KB
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2001
8
Photo Resist Stripping Using an Alkaline Accelerator Containing Wet-Vapor
Pantelides, Sokrates T.
,
Ojima, Senri
,
Nitta, Takahisa
,
Miki, Nobuhiro
,
Ohmi, Tadahiro
Journal:
Solid State Phenomena
Year:
2001
File:
PDF, 381 KB
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2001
9
Dry Cleaning of Organic Contamination on Silicon Wafers Using Rapid Optical Surface Treatment
Danel, Adrien
,
Rochat, Névine
,
Olivier, M.
,
Roche, A.
,
Tardif, F.
Journal:
Solid State Phenomena
Year:
2001
File:
PDF, 334 KB
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2001
10
Layer-By-Layer Oxidation of Silicon
Hattori, Takeshi
,
Takahashi, Kazuhiko
,
Nohira, H.
,
Ohmi, Tadahiro
Journal:
Solid State Phenomena
Year:
2001
File:
PDF, 331 KB
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2001
11
Characterization and Production Metrology of Thin Transistor Gate Dielectric Films
Chism, William
,
Diebold, Alain C.
,
Canterbury, Jesse
,
Richter, Curt
Journal:
Solid State Phenomena
Year:
2001
File:
PDF, 295 KB
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2001
12
Metal Wet Cleaning with No Corrosion: A Novel Approach
Pipia, Francesco
,
Choi, Geun Min
,
Ohmi, Tadahiro
Journal:
Solid State Phenomena
Year:
2001
File:
PDF, 326 KB
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2001
13
Gap States at the Interface of Ultra-Thin Oxide and Organic Films on Si(100)
Bitzer, T.
,
Rada, T.
,
Richardson, N.V.
,
Dittrich, T.
,
Koch, F.
Journal:
Solid State Phenomena
Year:
2001
File:
PDF, 298 KB
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2001
14
Influence of Boron and Fluorine Incorporation on the Network Structure of Ultrathin SiO2
Miyazaki, Seiichi
,
Morino, Kazuhiro
,
Hirose, Masataka
Journal:
Solid State Phenomena
Year:
2001
File:
PDF, 355 KB
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2001
15
Megasonic, Non-Contact Cleaning Followed by 'Rotagoni' Drying of CMP Wafers
Lauerhaas, Jeffrey M.
,
Mertens, Paul W.
,
Nicolosi, Tom
,
Kenis, Karine
,
Fyen, Wim
,
Heyns, Marc M.
Journal:
Solid State Phenomena
Year:
2001
File:
PDF, 435 KB
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2001
16
Use of Surfactants for Improved Particle Performance of dHF-Based Cleaning Recipes
Vos, Rita
,
Xu, Kai Dong
,
Lux, Marcel
,
Fyen, Wim
,
Singh, R.
,
Chen, Zhe Fei
,
Mertens, Paul W.
,
Hatcher, Z.
,
Heyns, Marc M.
Journal:
Solid State Phenomena
Year:
2001
File:
PDF, 366 KB
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2001
17
Iron Bulk Concentration Effect on the Yield & Reliability of Thin Oxides
Lai, Kah Keen
,
Leong, Chee Kong
,
Yeo, Hwee Ling
Journal:
Solid State Phenomena
Year:
2001
File:
PDF, 296 KB
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2001
18
Synchronous Schlieren Image Analysis of Megasonic Single Wafer Cleaning
Azuma, Takashi
,
Tomozawa, Akihiro
,
Kinoshita, Hideo
,
Umemura, Shin-ichiro
Journal:
Solid State Phenomena
Year:
2001
File:
PDF, 296 KB
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2001
19
Fundamentals of Wafer Rinse Processes and the Interactions with Water Conservation and Recycling in Semiconductor Manufacturing Plants
Shadman, F.
,
Seif, D.
,
Peterson, T.
Journal:
Solid State Phenomena
Year:
2001
File:
PDF, 208 KB
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2001
20
Surface Characterization after Different Wet Chemical Cleans
Claes, Martine
,
Röhr, Erika
,
Conard, Thierry
,
De Smedt, F.
,
De Gendt, Stefan
,
Storm, W.
,
Bauer, T.
,
Mertens, Paul W.
,
Heyns, Marc M.
Journal:
Solid State Phenomena
Year:
2001
File:
PDF, 333 KB
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2001
21
Chemical Processing and Materials Compatibility of High-K Dielectric Materials for Advanced Gate Stacks
Guan, J.J.
,
Gale, Glenn W.
,
Bersuker, G.
,
Jackson, M.
,
Huff, Howard R.
Journal:
Solid State Phenomena
Year:
2001
File:
PDF, 333 KB
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2001
22
Electrochemical Study for the Characterization of Wet Silicon Oxide Surfaces
Bertagna, V.
,
Erre, R.
,
Rouelle, F.
,
Chemla, M.
,
Petitdidier, Sébastien
,
Lévy, Didier
Journal:
Solid State Phenomena
Year:
2001
File:
PDF, 328 KB
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2001
23
The Origins of Fluorine in Dry Ultrathin Silicon Oxides
Vereecke, Guy
,
Röhr, Erika
,
Carter, R.J.
,
Conard, Thierry
,
De Witte, H.
,
Heyns, Marc M.
Journal:
Solid State Phenomena
Year:
2001
File:
PDF, 305 KB
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2001
24
Rinsing and Drying Effects on Heterogeneous Substrates
Fyen, Wim
,
Vos, Rita
,
Devriendt, K.
,
Meuris, Marc
,
Mertens, Paul W.
,
Heyns, Marc M.
Journal:
Solid State Phenomena
Year:
2001
File:
PDF, 385 KB
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2001
25
A Probe of Chemical Oxide Growth Conditions
Shive, Larry W.
,
Frey, Claire
,
Vitus, Carissima
Journal:
Solid State Phenomena
Year:
2001
File:
PDF, 308 KB
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2001
26
Modification of Low-K SiCOH Film Porosity by a HF Solution
Shamiryan, Denis
,
Baklanov, Mikhail R.
,
Vereecke, Guy
,
Vanhaelemeersch, Serge
,
Maex, Karen
Journal:
Solid State Phenomena
Year:
2001
File:
PDF, 338 KB
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2001
27
Behaviors of Metallic Contaminants in Si Wafer Processing
Jeon, Joong S.
,
De Gendt, Stefan
,
Raghavan, Srini
,
Almanza-Workman, Marcia
,
Gonsalves, Cynthia
,
Ogle, Bob
Journal:
Solid State Phenomena
Year:
2001
File:
PDF, 284 KB
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2001
28
Influence of Cleaning on the Quality of the Bonding Interface in Direct Bonded Silicon Wafers
Nevin, W.A.
,
Gay, D.L.
,
O'Neill, G.
Journal:
Solid State Phenomena
Year:
2001
File:
PDF, 357 KB
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2001
29
Wettability Modification of Polysilicon for Stiction Reduction in Silicon Based Micro-electromechanical Structures
Almanza-Workman, Angeles Marcia
,
Raghavan, Srini
,
Deymier, Pierre
,
Monk, David J.
,
Roop, Ray
Journal:
Solid State Phenomena
Year:
2001
File:
PDF, 313 KB
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2001
30
Structural and Electrical Characterization of Ultra-Thin SiO2 Films Prepared by Catalytic Oxidation Method
Izumi, Akira
,
Kudo, Manabu
,
Matsumura, Hideki
Journal:
Solid State Phenomena
Year:
2001
File:
PDF, 311 KB
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2001
31
Silicon Wafer Cleaning Processes Monitoring by the Surface Charge Profiler Method
Danel, Adrien
,
Besson, Pascal
,
Lardin, T.
,
Tardif, F.
Journal:
Solid State Phenomena
Year:
2001
File:
PDF, 310 KB
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2001
32
New Method to Generate the High Concentration Ozonated Water by Using the Ultrapure Water of the Semiconductor Factory
Miyamoto, Makoto
,
Oya, Izumi
,
Noda, Seiji
,
Kuzumoto, Masaki
Journal:
Solid State Phenomena
Year:
2001
File:
PDF, 299 KB
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2001
33
Control of Ozonated Water Cleaning Process for Photoresist Removal
Lim, Sang Woo
,
Chidsey, C.E.D.
Journal:
Solid State Phenomena
Year:
2001
File:
PDF, 279 KB
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2001
34
An Exploration on the Bridge Formation Mechanism of Cylindrical Storage Poly-Silicon by Water Marks in High Performance 4Gigabit DRAM Capacitor
Lee, Kun Tack
,
Shim, Woo Gwan
,
Ko, Hyung Ho
,
Kim, Ho Young
,
Han, Yong Pil
,
Hah, Sang Rok
,
Moon, Joo Tae
Journal:
Solid State Phenomena
Year:
2001
File:
PDF, 345 KB
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2001
35
Effect of Copper on the Breakthrough Voltage of Poly-Si - Poly-Si Capacitors
Boehringer, M.
,
Pillion, J.E.
,
Erdmann, V.
,
Rygula, M.
,
Winz, K.
,
Brauchle, P.
,
Aquino, D.
,
Zhang, H.
,
Zahka, Joseph
,
Zielonka, G.
,
Hauber, J.
Journal:
Solid State Phenomena
Year:
2001
File:
PDF, 341 KB
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2001
36
Preparation and Characterization of Time Dependent Haze on Silicon Surfaces
Münter, N.
,
Kolbesen, Bernd O.
,
Storm, W.
,
Müller, Timo
Journal:
Solid State Phenomena
Year:
2001
File:
PDF, 398 KB
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2001
37
Controlling Silicon Surface Roughness During Photochemical Cleaning
Butterbaugh, Jeffery W.
,
Schwab, Brent
,
Sorsch, Thomas
,
Green, Martin L.
Journal:
Solid State Phenomena
Year:
2001
File:
PDF, 261 KB
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2001
38
Contamination and Cleaning of Oxide Areas Exposed During Copper CMP in Hydroxylamine Based Slurries
Shang, C.
,
Huang, Wayne
,
Raghavan, Srini
,
Chen, Zhe Fei
,
Small, Robert
,
Peterson, M.
,
Jeon, Jeong Sic
Journal:
Solid State Phenomena
Year:
2001
File:
PDF, 294 KB
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2001
39
Application of Megasonic Single Wafer Cleaning Technology to LSI Mass Production Line
Shimada, Yutaka
,
Itou, Hiroshi
,
Ishii, Y.
,
Shirasu, Tatsumi
,
Tomozawa, Akihiro
Journal:
Solid State Phenomena
Year:
2001
File:
PDF, 305 KB
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2001
40
A Novel Rinsing Tank Concept to Save DI Water Using an Internal Recirculation Flow: 'Circle Stream Rinser'
Tardif, F.
,
de Bourmont, F.
,
Vareine, T.
,
Oravec, V.
,
Di Martino, A.
Journal:
Solid State Phenomena
Year:
2001
File:
PDF, 343 KB
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2001
41
Effect of Chemical Oxides Formed During Pre-Gate Oxide Cleaning on the Properties of Sub 20Ǻ Thick Ultra-Thin Stack Gate Dielectrics
Jeon, Joong S.
,
Ogle, Bob
Journal:
Solid State Phenomena
Year:
2001
File:
PDF, 299 KB
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2001
42
Particle Removal Mechanism of Hydrogenated Ultrapure Water with Megasonic Irradiation
Morita, Hiroshi
,
Ida, Jun ichi
,
Ota, Osamu
,
Tsukamoto, Kazumi
,
Ohmi, Tadahiro
Journal:
Solid State Phenomena
Year:
2001
File:
PDF, 338 KB
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2001
43
Dual Gate Oxide for 0.18μm Technologies and Below: Optimization of the Wet Processing Sequence
Lévy, Didier
,
Petitdidier, Sébastien
,
Bernard, H.
,
Guyader, F.
,
Dezauzier, C.
,
Pizzetti, C.
Journal:
Solid State Phenomena
Year:
2001
File:
PDF, 324 KB
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2001
44
Wet Preparation of Defect-Free Hydrogen-Terminated Silicon Wafer Surface and Its Characterization in Atomic-Scale
Takahagi, Takayuki
,
Shingubara, Shozo
,
Sakaue, Hiroyuki
Journal:
Solid State Phenomena
Year:
2001
File:
PDF, 568 KB
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2001
45
New Insights into Particle Adhesion
Eichenlaub, Sean
,
Cooper, Kevin
,
Gupta, Anand
,
Beaudoin, Stephen
Journal:
Solid State Phenomena
Year:
2001
File:
PDF, 368 KB
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2001
46
Pre-Diffusion Cleaning Using Ozone and HF
Bergman, Eric J.
,
Lagrange, Sebastien
,
Claes, Martine
,
De Gendt, Stefan
,
Röhr, Erika
Journal:
Solid State Phenomena
Year:
2001
File:
PDF, 439 KB
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2001
47
Materials Compatibility and Organic Build-Up during Ozone-Based Cleaning of Semiconductor Devices
De Smedt, F.
,
De Gendt, Stefan
,
Heyns, Marc M.
,
Vinckier, Chris
Journal:
Solid State Phenomena
Year:
2001
File:
PDF, 265 KB
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2001
48
From Piranha to Barracuda: Mechanism of Ozone and Water Vapor Photoresist Strip in a Wet Bench
Riedel, T.
,
Wolke, K.
,
De Gendt, Stefan
,
Onsia, Bart
Journal:
Solid State Phenomena
Year:
2001
File:
PDF, 308 KB
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2001
49
The Effect of Ion Implantation on the Metal Contamination of Silicon Surfaces in Aqueous Solution
Loewenstein, Lee M.
,
Mertens, Paul W.
,
Heyns, Marc M.
Journal:
Solid State Phenomena
Year:
2001
File:
PDF, 188 KB
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2001
50
Low Consumption Front End of the Line Cleaning: LC-FEOL
Besson, Pascal
,
Cowache, C.
,
Fabbri, J.M.
,
Tardif, F.
,
Beverina, Alessio
Journal:
Solid State Phenomena
Year:
2001
File:
PDF, 387 KB
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2001
51
New Aqueous Clean for Aluminum Interconnects: Part II. Applications
Ravikumar, R.
,
Rath, D.L.
,
Delehanty, D.J.
,
Filippi, R.G.
,
Kiewra, E.W.
,
Stojakovic, G.
,
McCullough, K.J.
,
Miura, D.D.
,
Gambino, J.
,
Schnabel, F.
,
Rhoads, B.N.
Journal:
Solid State Phenomena
Year:
2001
File:
PDF, 309 KB
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2001
52
Effect of Surface Charge and Fluid Properties on Particle Removal Characteristics of a Surface-Optimized REB Filter
Kelly, Wayne P.
,
Grant, Donald C.
,
Zahka, Joseph
,
Huang, Wayne
,
Raghavan, Srini
Journal:
Solid State Phenomena
Year:
2001
File:
PDF, 283 KB
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2001
53
SC-1 Clean Improvements for Post STI CMP
McAvey, Kenneth
,
Hoadley, Andrew
,
Binkerd, Chad
Journal:
Solid State Phenomena
Year:
2001
File:
PDF, 306 KB
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2001
54
Wet Cleaning of Trenches and Vias after Oxide/Nitride Dry Etch with Cu Exposed
Verhaverbeke, Steven
,
Shao, Jason Chi-Hao
,
Liu, Lewis
Journal:
Solid State Phenomena
Year:
2001
File:
PDF, 308 KB
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2001
55
Particle Deposition Studies in Acidic Solutions
Knotter, D. Martin
,
Dumesnil, Yolaine
Journal:
Solid State Phenomena
Year:
2001
File:
PDF, 337 KB
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2001
56
The Evolution of Chemical Oxides Into Ultrathin Oxides: A Spectroscopic Characterization
Eng, J.
,
Opila, R.L.
,
Rosamilia, J.M.
,
Sapjeta, B.J.
,
Chabal, Y.J.
,
Boone, T.
,
Masaitis, R.
,
Sorsch, Thomas
,
Green, Martin L.
Journal:
Solid State Phenomena
Year:
2001
File:
PDF, 287 KB
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2001
57
Pattern Dependent Corrosion Effects in HF Based Post Cu CMP Cleanings
Fyen, Wim
,
Teerlinck, I.
,
Lagrange, Sebastien
,
Brongersma, S.H.
,
Steegen, A.
,
Mertens, Paul W.
,
Heyns, Marc M.
Journal:
Solid State Phenomena
Year:
2001
File:
PDF, 344 KB
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2001
58
New Aqueous Clean for Aluminum Interconnects: Part I. Fundamentals
Rath, D.L.
,
Ravikumar, R.
,
Delehanty, D.J.
,
Filippi, R.G.
,
Kiewra, E.W.
,
Stojakovic, G.
,
McCullough, K.J.
,
Miura, D.D.
,
Rhoads, B.N.
Journal:
Solid State Phenomena
Year:
2001
File:
PDF, 337 KB
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2001
59
Improved Phosphoric Acid Mixtures for Nitride Strip
Vos, Rita
,
Lux, Marcel
,
Conard, Thierry
,
De Witte, H.
,
Mertens, Paul W.
,
Heyns, Marc M.
,
Hatcher, Z.
Journal:
Solid State Phenomena
Year:
2001
File:
PDF, 331 KB
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2001
60
Determination of Photoresist Degradation Products in O3/DI Processing
Vankerckhoven, H.
,
De Smedt, F.
,
Van Herp, B.
,
Claes, Martine
,
De Gendt, Stefan
,
Heyns, Marc M.
,
Vinckier, Chris
Journal:
Solid State Phenomena
Year:
2001
File:
PDF, 339 KB
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2001
61
The Role of Oxidant in HF-Based Solution for Noble Metal Removal from Substrate
Choi, Geun Min
,
Yokoi, Ikunori
,
Ohmi, Tadahiro
Journal:
Solid State Phenomena
Year:
2001
File:
PDF, 302 KB
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2001
62
Reduced Water Consumption for Post Clean Treatment and Metal Ion Contamination on VLSI Structures
Small, Robert
,
Chen, Zhe Fei
,
Wang, Cherry
,
Hon, Becky
Journal:
Solid State Phenomena
Year:
2001
File:
PDF, 299 KB
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2001
63
Electronic Properties of Wet-Chemically Prepared Oxide Layers
Angermann, H.
,
Henrion, W.
,
Rebien, M.
Journal:
Solid State Phenomena
Year:
2001
File:
PDF, 336 KB
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2001
64
Post Copper CMP: a Two Steps Cleaning Recipe
Beverina, Alessio
,
Fabbri, J.M.
,
Lévy, Didier
,
Tardif, F.
,
Besson, Pascal
Journal:
Solid State Phenomena
Year:
2001
File:
PDF, 448 KB
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2001
65
Barium, Strontium and Bismuth Contamination in CMOS Processes
Boubekeur, H.
,
Mikolajick, T.
,
Höpfner, J.
,
Dehm, C.
,
Pamler, W.
,
Steiner, J.
,
Kilian, G.
,
Kolbesen, Bernd O.
,
Bauer, Anton J.
,
Frey, Lothar
,
Ryssel, Heiner
Journal:
Solid State Phenomena
Year:
2001
File:
PDF, 478 KB
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2001
66
Single Chemistry Cleaning Solution for Advanced Wafer Cleaning
Vos, Rita
,
Doll, O.
,
Fester, A.
,
Kolbesen, Bernd O.
,
Lux, Marcel
,
Kenis, Karine
,
Onsia, Bart
,
Degendt, S.
,
Schellkes, E.
,
Hatcher, Z.
,
Mertens, Paul W.
,
Heyns, Marc M.
Journal:
Solid State Phenomena
Year:
2001
File:
PDF, 302 KB
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2001
67
Defects and Contamination in Microelectronic Device Production: State-of-the-Art and Prospects
Kolbesen, Bernd O.
,
Cerva, Hans
,
Zoth, G.
Journal:
Solid State Phenomena
Year:
2001
File:
PDF, 555 KB
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2001
68
Characterization of DI Water/O3 Oxidation of Si (100) and Si (111) Surfaces by OCP Measurements
Okorn-Schmidt, Harald
,
D'Emic, C.
,
Murphy, R.
Journal:
Solid State Phenomena
Year:
2001
File:
PDF, 277 KB
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2001
69
New Single Wafer Double Sided Spin Cleaning Method
Starflinger, Walter
,
Sellmer, Reinhard
,
Detterbeck, Stefan
,
Lechner, Alfred
,
Leberzammer, Jörg
,
Kruwinus, Hans-Jürgen
Journal:
Solid State Phenomena
Year:
2001
File:
PDF, 354 KB
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2001
70
Non-Contact Post Cu CMP Cleaning Using Megasonic Energy
Fyen, Wim
,
Lauerhaas, Jeffrey M.
,
Vos, Ingrid
,
Meuris, Marc
,
Mertens, Paul W.
,
Heyns, Marc M.
Journal:
Solid State Phenomena
Year:
2001
File:
PDF, 381 KB
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2001
71
Megasonic Silicon Wafer Cleaning and Its Influence on LSI Devices
Tomozawa, Akihiro
,
Ohnishi, Akihiro
,
Kinoshita, Hideo
,
Nakano, Takashi
Journal:
Solid State Phenomena
Year:
2001
File:
PDF, 531 KB
Your tags:
2001
72
A Hydrogenated Water Application to Semiconductor Manufacturing
Yokoi, Ikunori
,
Choi, Geun Min
,
Yamazaki, Yoshio
,
Ohmi, Tadahiro
Journal:
Solid State Phenomena
Year:
2001
File:
PDF, 295 KB
Your tags:
2001
73
Novel Back Side Processes for Copper and Pre-Lithography Cleans
Aegerter, Brian
,
Lagrange, Sebastien
,
Dundas, Curt
,
Van Doorne, Patrick
Journal:
Solid State Phenomena
Year:
2001
File:
PDF, 729 KB
Your tags:
2001
74
A Controlled Deposition of Organic Contamination and the Removal with Ozone Based Cleanings
Claes, Martine
,
De Gendt, Stefan
,
Kenens, C.
,
Conard, Thierry
,
Bender, H.
,
Storm, W.
,
Bauer, T.
,
Lagrange, Sebastien
,
Mertens, Paul W.
,
Heyns, Marc M.
Journal:
Solid State Phenomena
Year:
2001
File:
PDF, 359 KB
Your tags:
2001
75
The Effect of DI Water and Intermediate Rinse Solutions on Post Metal Etch Residue Removal Using Semi-Aqueous Cleaning Chemistries
Kirk, Simon J.
,
Small, Robert
Journal:
Solid State Phenomena
Year:
2001
File:
PDF, 357 KB
Your tags:
2001
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