Volume 76-77

Solid State Phenomena

Volume 76-77

1

Optimisations of SC-1 Conditions for Sub 0.18μm Technologies in an Industrial Environment

Petitdidier, Sébastien, Bernard, H., Bellandi, Enrico, Landa, F., Shirakawa, H., Lévy, Didier

Journal:

Solid State Phenomena

Year:

2001

File:

PDF, 340 KB

2001

2

Post SiN Etching Cleaning During Copper and Low K Integration

Beverina, Alessio, Louis, Didier, Arvet, C., Lajoinie, E., Besson, Pascal, Peyne, C., Holmes, Douglas, Maloney, D., Lee, S., Lee, W.M.

Journal:

Solid State Phenomena

Year:

2001

File:

PDF, 376 KB

2001

3

Particle Removal Efficiency Evaluation at 40 nm Using Haze Particle Standard

Yoo, Seong Ho, Liu, Benjamin Y.H., Sun, James, Narayanswami, Natraj, Thomes, Gregory P.

Journal:

Solid State Phenomena

Year:

2001

File:

PDF, 334 KB

2001

4

The Ozone Solubility and its Decay in Aqueous Solutions: Crucial Issues in Ozonated Chemistries for Semiconductor Cleaning

De Smedt, F., De Gendt, Stefan, Heyns, Marc M., Vinckier, Chris

Journal:

Solid State Phenomena

Year:

2001

File:

PDF, 260 KB

2001

5

Detection and Identification of Organic Contamination on Silicon Substrates

Roche, A., Marthon, S., Ple, J.F., Rochat, Névine, Danel, Adrien, Olivier, M., Juhel, M., Tardif, F.

Journal:

Solid State Phenomena

Year:

2001

File:

PDF, 358 KB

2001

6

Investigation of Trace Metals Analyses of Dry Residue on Silicon Wafer Surfaces by TXRF and ICP-MS

Wang, Jiang Bo, Balazs, M., Pianetta, Piero, Baur, K., Brennan, S.

Journal:

Solid State Phenomena

Year:

2001

File:

PDF, 360 KB

2001

7

Silicon Surface Cleaning after Spacer Dry Etching

Shamiryan, Denis, Baklanov, Mikhail R., Vanhaelemeersch, Serge

Journal:

Solid State Phenomena

Year:

2001

File:

PDF, 304 KB

2001

8

Photo Resist Stripping Using an Alkaline Accelerator Containing Wet-Vapor

Pantelides, Sokrates T., Ojima, Senri, Nitta, Takahisa, Miki, Nobuhiro, Ohmi, Tadahiro

Journal:

Solid State Phenomena

Year:

2001

File:

PDF, 381 KB

2001

9

Dry Cleaning of Organic Contamination on Silicon Wafers Using Rapid Optical Surface Treatment

Danel, Adrien, Rochat, Névine, Olivier, M., Roche, A., Tardif, F.

Journal:

Solid State Phenomena

Year:

2001

File:

PDF, 334 KB

2001

10

Layer-By-Layer Oxidation of Silicon

Hattori, Takeshi, Takahashi, Kazuhiko, Nohira, H., Ohmi, Tadahiro

Journal:

Solid State Phenomena

Year:

2001

File:

PDF, 331 KB

2001

11

Characterization and Production Metrology of Thin Transistor Gate Dielectric Films

Chism, William, Diebold, Alain C., Canterbury, Jesse, Richter, Curt

Journal:

Solid State Phenomena

Year:

2001

File:

PDF, 295 KB

2001

12

Metal Wet Cleaning with No Corrosion: A Novel Approach

Pipia, Francesco, Choi, Geun Min, Ohmi, Tadahiro

Journal:

Solid State Phenomena

Year:

2001

File:

PDF, 326 KB

2001

13

Gap States at the Interface of Ultra-Thin Oxide and Organic Films on Si(100)

Bitzer, T., Rada, T., Richardson, N.V., Dittrich, T., Koch, F.

Journal:

Solid State Phenomena

Year:

2001

File:

PDF, 298 KB

2001

14

Influence of Boron and Fluorine Incorporation on the Network Structure of Ultrathin SiO2

Miyazaki, Seiichi, Morino, Kazuhiro, Hirose, Masataka

Journal:

Solid State Phenomena

Year:

2001

File:

PDF, 355 KB

2001

15

Megasonic, Non-Contact Cleaning Followed by 'Rotagoni' Drying of CMP Wafers

Lauerhaas, Jeffrey M., Mertens, Paul W., Nicolosi, Tom, Kenis, Karine, Fyen, Wim, Heyns, Marc M.

Journal:

Solid State Phenomena

Year:

2001

File:

PDF, 435 KB

2001

16

Use of Surfactants for Improved Particle Performance of dHF-Based Cleaning Recipes

Vos, Rita, Xu, Kai Dong, Lux, Marcel, Fyen, Wim, Singh, R., Chen, Zhe Fei, Mertens, Paul W., Hatcher, Z., Heyns, Marc M.

Journal:

Solid State Phenomena

Year:

2001

File:

PDF, 366 KB

2001

17

Iron Bulk Concentration Effect on the Yield & Reliability of Thin Oxides

Lai, Kah Keen, Leong, Chee Kong, Yeo, Hwee Ling

Journal:

Solid State Phenomena

Year:

2001

File:

PDF, 296 KB

2001

18

Synchronous Schlieren Image Analysis of Megasonic Single Wafer Cleaning

Azuma, Takashi, Tomozawa, Akihiro, Kinoshita, Hideo, Umemura, Shin-ichiro

Journal:

Solid State Phenomena

Year:

2001

File:

PDF, 296 KB

2001

19

Fundamentals of Wafer Rinse Processes and the Interactions with Water Conservation and Recycling in Semiconductor Manufacturing Plants

Shadman, F., Seif, D., Peterson, T.

Journal:

Solid State Phenomena

Year:

2001

File:

PDF, 208 KB

2001

20

Surface Characterization after Different Wet Chemical Cleans

Claes, Martine, Röhr, Erika, Conard, Thierry, De Smedt, F., De Gendt, Stefan, Storm, W., Bauer, T., Mertens, Paul W., Heyns, Marc M.

Journal:

Solid State Phenomena

Year:

2001

File:

PDF, 333 KB

2001

21

Chemical Processing and Materials Compatibility of High-K Dielectric Materials for Advanced Gate Stacks

Guan, J.J., Gale, Glenn W., Bersuker, G., Jackson, M., Huff, Howard R.

Journal:

Solid State Phenomena

Year:

2001

File:

PDF, 333 KB

2001

22

Electrochemical Study for the Characterization of Wet Silicon Oxide Surfaces

Bertagna, V., Erre, R., Rouelle, F., Chemla, M., Petitdidier, Sébastien, Lévy, Didier

Journal:

Solid State Phenomena

Year:

2001

File:

PDF, 328 KB

2001

23

The Origins of Fluorine in Dry Ultrathin Silicon Oxides

Vereecke, Guy, Röhr, Erika, Carter, R.J., Conard, Thierry, De Witte, H., Heyns, Marc M.

Journal:

Solid State Phenomena

Year:

2001

File:

PDF, 305 KB

2001

24

Rinsing and Drying Effects on Heterogeneous Substrates

Fyen, Wim, Vos, Rita, Devriendt, K., Meuris, Marc, Mertens, Paul W., Heyns, Marc M.

Journal:

Solid State Phenomena

Year:

2001

File:

PDF, 385 KB

2001

25

A Probe of Chemical Oxide Growth Conditions

Shive, Larry W., Frey, Claire, Vitus, Carissima

Journal:

Solid State Phenomena

Year:

2001

File:

PDF, 308 KB

2001

26

Modification of Low-K SiCOH Film Porosity by a HF Solution

Shamiryan, Denis, Baklanov, Mikhail R., Vereecke, Guy, Vanhaelemeersch, Serge, Maex, Karen

Journal:

Solid State Phenomena

Year:

2001

File:

PDF, 338 KB

2001

27

Behaviors of Metallic Contaminants in Si Wafer Processing

Jeon, Joong S., De Gendt, Stefan, Raghavan, Srini, Almanza-Workman, Marcia, Gonsalves, Cynthia, Ogle, Bob

Journal:

Solid State Phenomena

Year:

2001

File:

PDF, 284 KB

2001

28

Influence of Cleaning on the Quality of the Bonding Interface in Direct Bonded Silicon Wafers

Nevin, W.A., Gay, D.L., O'Neill, G.

Journal:

Solid State Phenomena

Year:

2001

File:

PDF, 357 KB

2001

29

Wettability Modification of Polysilicon for Stiction Reduction in Silicon Based Micro-electromechanical Structures

Almanza-Workman, Angeles Marcia, Raghavan, Srini, Deymier, Pierre, Monk, David J., Roop, Ray

Journal:

Solid State Phenomena

Year:

2001

File:

PDF, 313 KB

2001

30

Structural and Electrical Characterization of Ultra-Thin SiO2 Films Prepared by Catalytic Oxidation Method

Izumi, Akira, Kudo, Manabu, Matsumura, Hideki

Journal:

Solid State Phenomena

Year:

2001

File:

PDF, 311 KB

2001

31

Silicon Wafer Cleaning Processes Monitoring by the Surface Charge Profiler Method

Danel, Adrien, Besson, Pascal, Lardin, T., Tardif, F.

Journal:

Solid State Phenomena

Year:

2001

File:

PDF, 310 KB

2001

32

New Method to Generate the High Concentration Ozonated Water by Using the Ultrapure Water of the Semiconductor Factory

Miyamoto, Makoto, Oya, Izumi, Noda, Seiji, Kuzumoto, Masaki

Journal:

Solid State Phenomena

Year:

2001

File:

PDF, 299 KB

2001

33

Control of Ozonated Water Cleaning Process for Photoresist Removal

Lim, Sang Woo, Chidsey, C.E.D.

Journal:

Solid State Phenomena

Year:

2001

File:

PDF, 279 KB

2001

34

An Exploration on the Bridge Formation Mechanism of Cylindrical Storage Poly-Silicon by Water Marks in High Performance 4Gigabit DRAM Capacitor

Lee, Kun Tack, Shim, Woo Gwan, Ko, Hyung Ho, Kim, Ho Young, Han, Yong Pil, Hah, Sang Rok, Moon, Joo Tae

Journal:

Solid State Phenomena

Year:

2001

File:

PDF, 345 KB

2001

35

Effect of Copper on the Breakthrough Voltage of Poly-Si - Poly-Si Capacitors

Boehringer, M., Pillion, J.E., Erdmann, V., Rygula, M., Winz, K., Brauchle, P., Aquino, D., Zhang, H., Zahka, Joseph, Zielonka, G., Hauber, J.

Journal:

Solid State Phenomena

Year:

2001

File:

PDF, 341 KB

2001

36

Preparation and Characterization of Time Dependent Haze on Silicon Surfaces

Münter, N., Kolbesen, Bernd O., Storm, W., Müller, Timo

Journal:

Solid State Phenomena

Year:

2001

File:

PDF, 398 KB

2001

37

Controlling Silicon Surface Roughness During Photochemical Cleaning

Butterbaugh, Jeffery W., Schwab, Brent, Sorsch, Thomas, Green, Martin L.

Journal:

Solid State Phenomena

Year:

2001

File:

PDF, 261 KB

2001

38

Contamination and Cleaning of Oxide Areas Exposed During Copper CMP in Hydroxylamine Based Slurries

Shang, C., Huang, Wayne, Raghavan, Srini, Chen, Zhe Fei, Small, Robert, Peterson, M., Jeon, Jeong Sic

Journal:

Solid State Phenomena

Year:

2001

File:

PDF, 294 KB

2001

39

Application of Megasonic Single Wafer Cleaning Technology to LSI Mass Production Line

Shimada, Yutaka, Itou, Hiroshi, Ishii, Y., Shirasu, Tatsumi, Tomozawa, Akihiro

Journal:

Solid State Phenomena

Year:

2001

File:

PDF, 305 KB

2001

40

A Novel Rinsing Tank Concept to Save DI Water Using an Internal Recirculation Flow: 'Circle Stream Rinser'

Tardif, F., de Bourmont, F., Vareine, T., Oravec, V., Di Martino, A.

Journal:

Solid State Phenomena

Year:

2001

File:

PDF, 343 KB

2001

41

Effect of Chemical Oxides Formed During Pre-Gate Oxide Cleaning on the Properties of Sub 20Ǻ Thick Ultra-Thin Stack Gate Dielectrics

Jeon, Joong S., Ogle, Bob

Journal:

Solid State Phenomena

Year:

2001

File:

PDF, 299 KB

2001

42

Particle Removal Mechanism of Hydrogenated Ultrapure Water with Megasonic Irradiation

Morita, Hiroshi, Ida, Jun ichi, Ota, Osamu, Tsukamoto, Kazumi, Ohmi, Tadahiro

Journal:

Solid State Phenomena

Year:

2001

File:

PDF, 338 KB

2001

43

Dual Gate Oxide for 0.18μm Technologies and Below: Optimization of the Wet Processing Sequence

Lévy, Didier, Petitdidier, Sébastien, Bernard, H., Guyader, F., Dezauzier, C., Pizzetti, C.

Journal:

Solid State Phenomena

Year:

2001

File:

PDF, 324 KB

2001

44

Wet Preparation of Defect-Free Hydrogen-Terminated Silicon Wafer Surface and Its Characterization in Atomic-Scale

Takahagi, Takayuki, Shingubara, Shozo, Sakaue, Hiroyuki

Journal:

Solid State Phenomena

Year:

2001

File:

PDF, 568 KB

2001

45

New Insights into Particle Adhesion

Eichenlaub, Sean, Cooper, Kevin, Gupta, Anand, Beaudoin, Stephen

Journal:

Solid State Phenomena

Year:

2001

File:

PDF, 368 KB

2001

46

Pre-Diffusion Cleaning Using Ozone and HF

Bergman, Eric J., Lagrange, Sebastien, Claes, Martine, De Gendt, Stefan, Röhr, Erika

Journal:

Solid State Phenomena

Year:

2001

File:

PDF, 439 KB

2001

47

Materials Compatibility and Organic Build-Up during Ozone-Based Cleaning of Semiconductor Devices

De Smedt, F., De Gendt, Stefan, Heyns, Marc M., Vinckier, Chris

Journal:

Solid State Phenomena

Year:

2001

File:

PDF, 265 KB

2001

48

From Piranha to Barracuda: Mechanism of Ozone and Water Vapor Photoresist Strip in a Wet Bench

Riedel, T., Wolke, K., De Gendt, Stefan, Onsia, Bart

Journal:

Solid State Phenomena

Year:

2001

File:

PDF, 308 KB

2001

49

The Effect of Ion Implantation on the Metal Contamination of Silicon Surfaces in Aqueous Solution

Loewenstein, Lee M., Mertens, Paul W., Heyns, Marc M.

Journal:

Solid State Phenomena

Year:

2001

File:

PDF, 188 KB

2001

50

Low Consumption Front End of the Line Cleaning: LC-FEOL

Besson, Pascal, Cowache, C., Fabbri, J.M., Tardif, F., Beverina, Alessio

Journal:

Solid State Phenomena

Year:

2001

File:

PDF, 387 KB

2001

51

New Aqueous Clean for Aluminum Interconnects: Part II. Applications

Ravikumar, R., Rath, D.L., Delehanty, D.J., Filippi, R.G., Kiewra, E.W., Stojakovic, G., McCullough, K.J., Miura, D.D., Gambino, J., Schnabel, F., Rhoads, B.N.

Journal:

Solid State Phenomena

Year:

2001

File:

PDF, 309 KB

2001

52

Effect of Surface Charge and Fluid Properties on Particle Removal Characteristics of a Surface-Optimized REB Filter

Kelly, Wayne P., Grant, Donald C., Zahka, Joseph, Huang, Wayne, Raghavan, Srini

Journal:

Solid State Phenomena

Year:

2001

File:

PDF, 283 KB

2001

53

SC-1 Clean Improvements for Post STI CMP

McAvey, Kenneth, Hoadley, Andrew, Binkerd, Chad

Journal:

Solid State Phenomena

Year:

2001

File:

PDF, 306 KB

2001

54

Wet Cleaning of Trenches and Vias after Oxide/Nitride Dry Etch with Cu Exposed

Verhaverbeke, Steven, Shao, Jason Chi-Hao, Liu, Lewis

Journal:

Solid State Phenomena

Year:

2001

File:

PDF, 308 KB

2001

55

Particle Deposition Studies in Acidic Solutions

Knotter, D. Martin, Dumesnil, Yolaine

Journal:

Solid State Phenomena

Year:

2001

File:

PDF, 337 KB

2001

56

The Evolution of Chemical Oxides Into Ultrathin Oxides: A Spectroscopic Characterization

Eng, J., Opila, R.L., Rosamilia, J.M., Sapjeta, B.J., Chabal, Y.J., Boone, T., Masaitis, R., Sorsch, Thomas, Green, Martin L.

Journal:

Solid State Phenomena

Year:

2001

File:

PDF, 287 KB

2001

57

Pattern Dependent Corrosion Effects in HF Based Post Cu CMP Cleanings

Fyen, Wim, Teerlinck, I., Lagrange, Sebastien, Brongersma, S.H., Steegen, A., Mertens, Paul W., Heyns, Marc M.

Journal:

Solid State Phenomena

Year:

2001

File:

PDF, 344 KB

2001

58

New Aqueous Clean for Aluminum Interconnects: Part I. Fundamentals

Rath, D.L., Ravikumar, R., Delehanty, D.J., Filippi, R.G., Kiewra, E.W., Stojakovic, G., McCullough, K.J., Miura, D.D., Rhoads, B.N.

Journal:

Solid State Phenomena

Year:

2001

File:

PDF, 337 KB

2001

59

Improved Phosphoric Acid Mixtures for Nitride Strip

Vos, Rita, Lux, Marcel, Conard, Thierry, De Witte, H., Mertens, Paul W., Heyns, Marc M., Hatcher, Z.

Journal:

Solid State Phenomena

Year:

2001

File:

PDF, 331 KB

2001

60

Determination of Photoresist Degradation Products in O3/DI Processing

Vankerckhoven, H., De Smedt, F., Van Herp, B., Claes, Martine, De Gendt, Stefan, Heyns, Marc M., Vinckier, Chris

Journal:

Solid State Phenomena

Year:

2001

File:

PDF, 339 KB

2001

61

The Role of Oxidant in HF-Based Solution for Noble Metal Removal from Substrate

Choi, Geun Min, Yokoi, Ikunori, Ohmi, Tadahiro

Journal:

Solid State Phenomena

Year:

2001

File:

PDF, 302 KB

2001

62

Reduced Water Consumption for Post Clean Treatment and Metal Ion Contamination on VLSI Structures

Small, Robert, Chen, Zhe Fei, Wang, Cherry, Hon, Becky

Journal:

Solid State Phenomena

Year:

2001

File:

PDF, 299 KB

2001

63

Electronic Properties of Wet-Chemically Prepared Oxide Layers

Angermann, H., Henrion, W., Rebien, M.

Journal:

Solid State Phenomena

Year:

2001

File:

PDF, 336 KB

2001

64

Post Copper CMP: a Two Steps Cleaning Recipe

Beverina, Alessio, Fabbri, J.M., Lévy, Didier, Tardif, F., Besson, Pascal

Journal:

Solid State Phenomena

Year:

2001

File:

PDF, 448 KB

2001

65

Barium, Strontium and Bismuth Contamination in CMOS Processes

Boubekeur, H., Mikolajick, T., Höpfner, J., Dehm, C., Pamler, W., Steiner, J., Kilian, G., Kolbesen, Bernd O., Bauer, Anton J., Frey, Lothar, Ryssel, Heiner

Journal:

Solid State Phenomena

Year:

2001

File:

PDF, 478 KB

2001

66

Single Chemistry Cleaning Solution for Advanced Wafer Cleaning

Vos, Rita, Doll, O., Fester, A., Kolbesen, Bernd O., Lux, Marcel, Kenis, Karine, Onsia, Bart, Degendt, S., Schellkes, E., Hatcher, Z., Mertens, Paul W., Heyns, Marc M.

Journal:

Solid State Phenomena

Year:

2001

File:

PDF, 302 KB

2001

67

Defects and Contamination in Microelectronic Device Production: State-of-the-Art and Prospects

Kolbesen, Bernd O., Cerva, Hans, Zoth, G.

Journal:

Solid State Phenomena

Year:

2001

File:

PDF, 555 KB

2001

68

Characterization of DI Water/O3 Oxidation of Si (100) and Si (111) Surfaces by OCP Measurements

Okorn-Schmidt, Harald, D'Emic, C., Murphy, R.

Journal:

Solid State Phenomena

Year:

2001

File:

PDF, 277 KB

2001

69

New Single Wafer Double Sided Spin Cleaning Method

Starflinger, Walter, Sellmer, Reinhard, Detterbeck, Stefan, Lechner, Alfred, Leberzammer, Jörg, Kruwinus, Hans-Jürgen

Journal:

Solid State Phenomena

Year:

2001

File:

PDF, 354 KB

2001

70

Non-Contact Post Cu CMP Cleaning Using Megasonic Energy

Fyen, Wim, Lauerhaas, Jeffrey M., Vos, Ingrid, Meuris, Marc, Mertens, Paul W., Heyns, Marc M.

Journal:

Solid State Phenomena

Year:

2001

File:

PDF, 381 KB

2001

71

Megasonic Silicon Wafer Cleaning and Its Influence on LSI Devices

Tomozawa, Akihiro, Ohnishi, Akihiro, Kinoshita, Hideo, Nakano, Takashi

Journal:

Solid State Phenomena

Year:

2001

File:

PDF, 531 KB

2001

72

A Hydrogenated Water Application to Semiconductor Manufacturing

Yokoi, Ikunori, Choi, Geun Min, Yamazaki, Yoshio, Ohmi, Tadahiro

Journal:

Solid State Phenomena

Year:

2001

File:

PDF, 295 KB

2001

73

Novel Back Side Processes for Copper and Pre-Lithography Cleans

Aegerter, Brian, Lagrange, Sebastien, Dundas, Curt, Van Doorne, Patrick

Journal:

Solid State Phenomena

Year:

2001

File:

PDF, 729 KB

2001

74

A Controlled Deposition of Organic Contamination and the Removal with Ozone Based Cleanings

Claes, Martine, De Gendt, Stefan, Kenens, C., Conard, Thierry, Bender, H., Storm, W., Bauer, T., Lagrange, Sebastien, Mertens, Paul W., Heyns, Marc M.

Journal:

Solid State Phenomena

Year:

2001

File:

PDF, 359 KB

2001

75

The Effect of DI Water and Intermediate Rinse Solutions on Post Metal Etch Residue Removal Using Semi-Aqueous Cleaning Chemistries

Kirk, Simon J., Small, Robert

Journal:

Solid State Phenomena

Year:

2001

File:

PDF, 357 KB

2001