Identification of deep trap energies and influences of...

Semiconductor Science and Technology 2015 / 03 Vol. 30; Iss. 3

Identification of deep trap energies and influences of oxygen plasma ashing on semiconductor carrier lifetime

Koprowski, A, Humbel, O, Plappert, M, Krenn, H
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Volume:
30
Language:
english
Journal:
Semiconductor Science and Technology
DOI:
10.1088/0268-1242/30/3/035004
Date:
March, 2015
File:
PDF, 2.24 MB
english, 2015
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