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Stripping and Cleaning of High-Dose Ion-Implanted Photoresists Using a Single-Wafer, Single-Chamber Dry/Wet Hybrid System
Kim, Y.J., Lee, J.H., Seo, K.J., Yoon, C.R., Roh, E.S., Cho, J.K., Hattori, T.Volume:
145-146
Year:
2009
Language:
english
Journal:
Solid State Phenomena
DOI:
10.4028/www.scientific.net/SSP.145-146.269
File:
PDF, 868 KB
english, 2009