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Thermal Stability of Ti/Mo Schottky Contacts on p-Si and Defects Introduced in p-Si during Electron Beam Deposition of Ti/Mo
Auret, F.D., Das, A.G.M., Nyamhere, C., Hayes, M., van der Berg, N.G.Volume:
108-109
Year:
2005
Language:
english
Journal:
Solid State Phenomena
DOI:
10.4028/www.scientific.net/SSP.108-109.561
File:
PDF, 374 KB
english, 2005