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Novel Low-K Dielectric Obtained by Xenon Implantation in SiO2
Assaf, H., Ntsoenzok, E., Ruault, M.O., Kaïtasov, O.Volume:
108-109
Year:
2005
Language:
english
Journal:
Solid State Phenomena
DOI:
10.4028/www.scientific.net/SSP.108-109.291
File:
PDF, 4.01 MB
english, 2005