Evaluation Method of Precipitated Oxygen Concentration in Low Resistivity Silicon Wafers Using X-Ray Diffration
Takeno, Hiroshi, Mizuno, Michihiro, Ushio, Satoshi, Takenaka, TakaoVolume:
196-201
Year:
1995
Journal:
Materials Science Forum
DOI:
10.4028/www.scientific.net/MSF.196-201.1865
File:
PDF, 354 KB
1995