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Selective Si3N4 Etch in Single Wafer Application
Knotter, D. Martin, Stewart, Nigel, Sharp, IanVolume:
103-104
Year:
2005
Language:
english
Journal:
Solid State Phenomena
DOI:
10.4028/www.scientific.net/SSP.103-104.103
File:
PDF, 295 KB
english, 2005