Volume 103-104

Solid State Phenomena

Volume 103-104

1

Dissolution Characteristics of Ceria in Ascorbic Acid Solutions with Implications to Cleaning

Tamilmani, S., Lowalekar, V., Raghavan, Srini, Small, Robert

Journal:

Solid State Phenomena

Year:

2005

File:

PDF, 552 KB

2005

2

A Study of the Influence of Typical Wet Chemical Treatments on the Germanium Wafer Surface

Onsia, Bart, Conard, Thierry, De Gendt, Stefan, Heyns, Marc M., Hoflijk, I., Mertens, Paul W., Meuris, Marc, Raskin, G., Sioncke, Sonja, Teerlinck, I., Theuwis, Antoon, Van Steenbergen, Jan, Vinckier,

Journal:

Solid State Phenomena

Year:

2005

File:

PDF, 630 KB

2005

3

Surface Preparation Techniques for High-k Deposition on Ge Substrates

Van Elshocht, Sven, Delabie, A., Brijs, B., Caymax, Matty, Conard, Thierry, Onsia, Bart, Puurunen, Riikka, Richard, Olivier, Van Steenbergen, Jan, Zhao, Chao, Meuris, Marc, Heyns, Marc M.

Journal:

Solid State Phenomena

Year:

2005

Language:

english

File:

PDF, 595 KB

english, 2005

4

Impact of Downstream Ash Plasmas on Ultra Low-k Materials

Possémé, Nicolas, David, Thibaut, Meininger, P., Louveau, O., Chevolleau, T., Joubert, O., Louis, Didier

Journal:

Solid State Phenomena

Year:

2005

Language:

english

File:

PDF, 620 KB

english, 2005

5

Evaluation of Megasonic Cleaning for Sub-90nm Technologies

Vereecke, Guy, Holsteyns, Frank, Arnauts, Sophia, Beckx, S., Jaenen, P., Kenis, Karine, Lismont, M., Lux, Marcel, Vos, Rita, Snow, James, Mertens, Paul W.

Journal:

Solid State Phenomena

Year:

2005

Language:

english

File:

PDF, 632 KB

english, 2005

6

HF Based Solutions for HfO2 Removal; Effect of pH and Temperature on HfO2: SiO2 Etch Selectivity

Paraschiv, Vasile, Claes, M., Baklanov, Mikhail R., Boullart, Werner, De Gendt, Stefan, Vanhaelemeersch, Serge

Journal:

Solid State Phenomena

Year:

2005

Language:

english

File:

PDF, 256 KB

english, 2005

7

High-k Gate Dielectrics on Silicon and Germanium: Impact of Surface Preparation

Beverina, Alessio, Frank, M.M., Shang, H., Rivillon, S., Amy, F., Hsueh, C.L., Paruchuri, V.K., Mo, R.T., Copel, M., Gusev, E.P., Gribelyuk, M.A., Chabal, Y.J.

Journal:

Solid State Phenomena

Year:

2005

Language:

english

File:

PDF, 280 KB

english, 2005

8

Photoresist Stripping by Ozone/Water Processes: Effect of Additives

Vankerckhoven, H., De Smedt, F., Vandersmissen, K., Claes, M., De Gendt, Stefan, Heyns, Marc M., Vinckier, Chris

Journal:

Solid State Phenomena

Year:

2005

Language:

english

File:

PDF, 193 KB

english, 2005

9

Behaviour of a Well-Designed Megasonic Cleaning System

Lippert, Alexander, Engesser, P., Ferrell, Garry, Klitzke, J., Köffler, Martin, Kumnig, Franz, Leberzammer, Jörg, Pfeuffer, Alexander, Obweger, Rainer, Sax, Harry, Okorn-Schmidt, Harald

Journal:

Solid State Phenomena

Year:

2005

Language:

english

File:

PDF, 686 KB

english, 2005

10

Cleaning Capability of High Concentration Ozonated Water

Haibara, Teruo, Uemura, Kenichi, Adachi, Takio

Journal:

Solid State Phenomena

Year:

2005

Language:

english

File:

PDF, 1.33 MB

english, 2005

11

Electrophoretic Studies on Silicon Nitride: Traces of Silicates in UPW Shift Zeta Potential Similar to SC-1

Pfeuffer, Alexander, Bensch, Wolfgang, Lechner, Alfred, Okorn-Schmidt, Harald

Journal:

Solid State Phenomena

Year:

2005

Language:

english

File:

PDF, 188 KB

english, 2005

12

Effective Rinse Aiming at Water-Mark-Free Drying for Single-Spin Wet Cleaning Process

Miya, Katsuhiko, Kishimoto, Takuya, Izumi, Akira

Journal:

Solid State Phenomena

Year:

2005

Language:

english

File:

PDF, 161 KB

english, 2005

13

Novel Photo Resist Stripping for Single Wafer Process

Okuyama, Atsushi, Asada, Kazumi, Abe, Hitoshi, Iwamoto, Hayato, Okamoto, Yoshio, Wada, Takuya

Journal:

Solid State Phenomena

Year:

2005

Language:

english

File:

PDF, 225 KB

english, 2005

14

Etch Rate Depth Profiling by Single Wafer Etching Equipment

Bellandi, Enrico, Elbaz, Alice C., Piagge, Rosella, Pipia, Francesco, Alessandri, Mauro

Journal:

Solid State Phenomena

Year:

2005

Language:

english

File:

PDF, 280 KB

english, 2005

15

In Situ Wafer Processing for Next Generation Devices

Kashkoush, Ismail, Liu, Lewis, Yialamas, Nick, Novak, R.

Journal:

Solid State Phenomena

Year:

2005

Language:

english

File:

PDF, 330 KB

english, 2005

16

Etching of Silicon Oxide Films in Supercritical Carbon Dioxide

Saga, Koichiro, Kuniyasu, Hitoshi, Hattori, Takeshi, Yamada, Kenji, Azuma, Tomoyuki

Journal:

Solid State Phenomena

Year:

2005

Language:

english

File:

PDF, 1.80 MB

english, 2005

17

Cu Spin Cleaning Evaluation by SOR X-Ray Fluorescence Analysis

Hayashi, Hidekazu, Tsugane, Ken, Kagoshima, Yasushi, Koyama, Takahisa, Watanabe, Masaharu, Kozuki, Yasushi

Journal:

Solid State Phenomena

Year:

2005

Language:

english

File:

PDF, 309 KB

english, 2005

18

A Comparison of Particle Filtration in a Recirculated Wet Bench Wet Cleaning Tool: Performance of PTFE Filters and of Surface Optimized Filters

Haas, Günter, Parekh, Bipin, Frankhauser, Jeremie, Viallet, Benoît, Palka, Patrick, Bras, Jérôme

Journal:

Solid State Phenomena

Year:

2005

Language:

english

File:

PDF, 288 KB

english, 2005

19

Evaluation of Wafer Drying Methods for GIGA-LEVEL Device Fabrication

Kim, Gyu Hyun, Choi, Geun Min, Song, Young Wook

Journal:

Solid State Phenomena

Year:

2005

Language:

english

File:

PDF, 526 KB

english, 2005

20

Advanced Aqueous Cleaner I, Dilute Solutions for the Selective Removal of Post Etch Residues in the Presence of Aluminium

Daviot, Jerome, Reid, Chris, Holmes, Douglas

Journal:

Solid State Phenomena

Year:

2005

File:

PDF, 901 KB

2005

21

Novel Chemical Etching to Correct Film Thickness Distributions

Ugajin, Hajime, Iwamoto, Hayato, Kinoshita, Kei

Journal:

Solid State Phenomena

Year:

2005

Language:

english

File:

PDF, 559 KB

english, 2005

22

Single Backside Cleaning on Silicon, Silicon Nitride and Silicon Oxide

Broussous, Lucile, Besson, Pascal, Frank, M.M., Bourgeat, D.

Journal:

Solid State Phenomena

Year:

2005

Language:

english

File:

PDF, 207 KB

english, 2005

23

Copper Decontamination Ability of Supercritical-CO2/Additives on CVD and Spin-On Porous MSQ Materials

Daviot, Jerome, Perrut, V., Gaillard, F., Millet, C., Danel, Adrien, Broussous, Lucile, Louis, Didier

Journal:

Solid State Phenomena

Year:

2005

Language:

english

File:

PDF, 461 KB

english, 2005

24

Supercritical CO2 Applications in BEOL Cleaning

Matz, P.D., Reidy, R.F.

Journal:

Solid State Phenomena

Year:

2005

Language:

english

File:

PDF, 718 KB

english, 2005

25

Organic Contamination Control in Silicon Surface Processing

Saga, Koichiro, Hattori, Takeshi

Journal:

Solid State Phenomena

Year:

2005

Language:

english

File:

PDF, 206 KB

english, 2005

26

Prevention of Copper Cross-Contamination on Cu Process and Non-Cu Process Mixed Fabrication

Shim, Joon Bum, Lee, Kang Hyun, Kim, Kee Ho, Park, Heung Soo

Journal:

Solid State Phenomena

Year:

2005

Language:

english

File:

PDF, 390 KB

english, 2005

27

Enhanced Surface Preparation Techniques for the Si/High-k Interface

Barnett, Joel, Young, Chadwin D., Moumen, Naim, Bersuker, Gennadi, Peterson, Jeff J., Brown, George A., Lee, Byoung Hun, Huff, Howard R.

Journal:

Solid State Phenomena

Year:

2005

Language:

english

File:

PDF, 168 KB

english, 2005

28

Challenges of Finer Particle Detection on Bulk-Silicon and SOI Wafers

Hattori, Takeshi, Okamoto, Akira, Kuniyasu, Hitoshi

Journal:

Solid State Phenomena

Year:

2005

Language:

english

File:

PDF, 463 KB

english, 2005

29

Uniform Ultrathin Oxide Growth for High-k Preclean

Butterbaugh, Jeffery W., Nelson, Steven L., Wagener, Thomas J.

Journal:

Solid State Phenomena

Year:

2005

Language:

english

File:

PDF, 294 KB

english, 2005

30

Insights into Watermark Formation and Control

Namba, Hiromitsu, Orii, Takehiko, Ohno, Hiroki, Gale, Glenn W.

Journal:

Solid State Phenomena

Year:

2005

Language:

english

File:

PDF, 198 KB

english, 2005

31

Simultaneous Analysis of Light and Heavy Organic Contamination on Silicon Wafer

Ritala, Heini, Eränen, Simo, Kiviranta, Arto, Räsänen, Jaakko, Tarkiainen, Virpi, Kiuru, Jari, Ketola, Raimo A.

Journal:

Solid State Phenomena

Year:

2005

Language:

english

File:

PDF, 251 KB

english, 2005

32

Strength Distribution of Megasonic Damage Events

Christenson, Kurt K.

Journal:

Solid State Phenomena

Year:

2005

Language:

english

File:

PDF, 198 KB

english, 2005

33

Selective Wet Removal of Hf-Based Layers and Post-Dry Etch Residues in High-k and Metal Gate Stacks

Claes, M., Paraschiv, Vasile, Beckx, S., Demand, M., Deweerd, W., Garaud, Sylvain, Kraus, H., Vos, Rita, Snow, James, Boullart, Werner, De Gendt, Stefan

Journal:

Solid State Phenomena

Year:

2005

Language:

english

File:

PDF, 1.68 MB

english, 2005

34

Selective Si3N4 Etch in Single Wafer Application

Knotter, D. Martin, Stewart, Nigel, Sharp, Ian

Journal:

Solid State Phenomena

Year:

2005

Language:

english

File:

PDF, 295 KB

english, 2005

35

Repair of Porous MSQ (p-MSQ) Films Using Monochlorosilanes Dissolved in Supercritical CO2

Xie, Bo, Muscat, Anthony

Journal:

Solid State Phenomena

Year:

2005

Language:

english

File:

PDF, 308 KB

english, 2005

36

Advanced Aqueous Cleaner II: PER Removal from Sensitive Cu/Low-k Devices

Reid, Chris, Daviot, Jerome, Holmes, Douglas

Journal:

Solid State Phenomena

Year:

2005

Language:

english

File:

PDF, 630 KB

english, 2005

37

UV Activated Surface Preparation of Silicon for High-k Dielectric Deposition

Finstad, Casey C., Muscat, Anthony

Journal:

Solid State Phenomena

Year:

2005

Language:

english

File:

PDF, 199 KB

english, 2005

38

Barrier and Copper Seedlayer Wet Etching

Richard, Claire Therese, Frank, M.M., Besson, Pascal, Serret, E., Hotellier, N., Beverina, Alessio, Dumas, L., Broussous, Lucile, Kovacs, F., Billon, Thierry

Journal:

Solid State Phenomena

Year:

2005

Language:

english

File:

PDF, 1.86 MB

english, 2005

39

A Force Study in Brush Scrubbing

Xu, Kai Dong, Vos, Rita, Vereecke, Guy, Doumen, G., Fyen, Wim, Mertens, Paul W., Heyns, Marc M., Vinckier, Chris, Fransaer, Jan

Journal:

Solid State Phenomena

Year:

2005

Language:

english

File:

PDF, 325 KB

english, 2005

40

Process, Environmental & Economical Considerations to Implement Single Wafer Cleaning Tools in 300mm Wafer Fabs

Garnier, Philippe, Horellou, G., Calvier, J.J., Labaty, D., Lévy, Didier

Journal:

Solid State Phenomena

Year:

2005

Language:

english

File:

PDF, 147 KB

english, 2005

41

Purification of Trace Amount of Metal Impurity from Ultra Pure Water Using Membrane Purifier/Filter

Hashimoto, Yukio, Amari, Mutsuhiro, Komatsu, Makoto, Fujiwara, Kunio

Journal:

Solid State Phenomena

Year:

2005

Language:

english

File:

PDF, 384 KB

english, 2005

42

Advanced Surface Cleaning Strategy for 65nm CMOS Device Performance Enhancement

Arnaud, F., Bernard, H., Beverina, Alessio, El-Farhane, R., Duriez, B., Barla, Kathy, Lévy, Didier

Journal:

Solid State Phenomena

Year:

2005

Language:

english

File:

PDF, 733 KB

english, 2005

43

Development of New Batch-Type Plasma Assisted NOR (Native-Oxide-Removal) Dry Cleaning Equipment

Kim, Wan Sik, Hwang, Wan Goo, Kim, Il-Kyoung, Yun, Ki-Young, Lee, Kwang Myung, Chae, Seung Ki

Journal:

Solid State Phenomena

Year:

2005

Language:

english

File:

PDF, 1.18 MB

english, 2005

44

The Impact of Backside Particles on the Limits of Optical Lithography

Bearda, Twan, Mertens, Paul W., Holsteyns, Frank, De Bisschop, Peter, Compen, René, van Meer, Aschwin, Heyns, Marc M.

Journal:

Solid State Phenomena

Year:

2005

Language:

english

File:

PDF, 502 KB

english, 2005

45

Chromium Contamination in Silicon: Detection and Impact on Oxide Performances

Polignano, Maria Luisa, Caputo, Daniele, Cerutti, F., Cottini, M., Farini, L., Reffle, J.

Journal:

Solid State Phenomena

Year:

2005

Language:

english

File:

PDF, 447 KB

english, 2005

46

VPD-DC-TXRF for Metallic Contamination Analysis of Ge Wafers

Hellin, David, Geens, V., Teerlinck, I., Van Steenbergen, Jan, Rip, Jens, Laureyn, W., Raskin, G., Mertens, Paul W., De Gendt, Stefan, Vinckier, Chris

Journal:

Solid State Phenomena

Year:

2005

Language:

english

File:

PDF, 207 KB

english, 2005

47

Application of HPLC for the Analysis of Organic Additives in Cleaning Chemicals and Cleaning Mixtures

Metzger, S., Kolbesen, Bernd O.

Journal:

Solid State Phenomena

Year:

2005

Language:

english

File:

PDF, 203 KB

english, 2005

48

Effects of Patterns on Corrosion in Cu CMP

Han, Ja Hyung, Koo, Ja Eung, Hong, Duk Ho, Park, Byung Lyul, Kim, Seong Il, Cho, In-Soo, Eom, Dae Hong, Park, Jin Goo, Busnaina, Ahmed A.

Journal:

Solid State Phenomena

Year:

2005

Language:

english

File:

PDF, 371 KB

english, 2005

49

Surfactionated Rinse against Pattern Collapse and Defectivity in 193nm Lithography

Misat, S.I., Grozev, G.G., Versluijs, J.J.

Journal:

Solid State Phenomena

Year:

2005

Language:

english

File:

PDF, 329 KB

english, 2005

50

Via Cleaning Technology for Post Etch Residues

Sharma, B.G., Prindle, Chris

Journal:

Solid State Phenomena

Year:

2005

Language:

english

File:

PDF, 565 KB

english, 2005

51

Aqueous Based Single Wafer Cu/Low-k Cleaning Process Characterization and Integration into Dual Damascene Process Flow

Tang, Jian She, Brown, Brian J., Verhaverbeke, Steven, Chen, Han Wen, Papanu, Jim, Hung, Raymond, Cai, Cathy, Yost, Dennis

Journal:

Solid State Phenomena

Year:

2005

Language:

english

File:

PDF, 903 KB

english, 2005

52

Effective Polymer Removal: Process Window-Process Uniformity-Extended Chemical Bath-Life

Yew-Leong, Chuan, Boon-Lim, Wee, A-Cady, Wayne, A-Mustapha, Nik, Keen-Lai, Kah

Journal:

Solid State Phenomena

Year:

2005

Language:

english

File:

PDF, 163 KB

english, 2005

53

Damage-Free Cleaning of Sub-50 nm Devices Using Directed Megasonics Technology in a Single Wafer Processor

Rosato, J.J., Yalamanchili, M.R., Beck, M.J., Lillard, R.Y.

Journal:

Solid State Phenomena

Year:

2005

Language:

english

File:

PDF, 435 KB

english, 2005

54

Direct Mixing Cleaning Method of Aqua Regia on Wafer

Ugajin, Hajime, Iwamoto, Hayato, Kinoshita, Kei

Journal:

Solid State Phenomena

Year:

2005

Language:

english

File:

PDF, 213 KB

english, 2005

55

Angled XPS Analysis of Low-k Dielectric Surfaces after Cleaning

Tan, Y.S., Chooi, Simon Y.M., Sin, Chian-Yuh, Ee, Ping-Yu, Srinivasan, M.P., Pehkonen, Simo Olavi

Journal:

Solid State Phenomena

Year:

2005

Language:

english

File:

PDF, 166 KB

english, 2005

56

Non-Damaging Particle Removal Using Cryogenic Aerosols

Wagener, Thomas J., Weygand, James F., Thomes, Gregory P.

Journal:

Solid State Phenomena

Year:

2005

Language:

english

File:

PDF, 207 KB

english, 2005

57

Non-Damaging CO2 Aerosol Cleaning in FEOL IC Manufacturing

Banerjee, Souvik, Campbell, Andrea

Journal:

Solid State Phenomena

Year:

2005

Language:

english

File:

PDF, 256 KB

english, 2005

58

Plasma Cleaning for W Polymetal Gate

Kabansky, Alex, Lee, Harry

Journal:

Solid State Phenomena

Year:

2005

Language:

english

File:

PDF, 548 KB

english, 2005

59

Activated He:H2 Strip of Photoresist over Porous Low-k Materials

Han, Qing Yuan, White, Brian, Berry, Ivan L., Waldfried, C., Escorcia, O.

Journal:

Solid State Phenomena

Year:

2005

Language:

english

File:

PDF, 228 KB

english, 2005

60

Metal Contamination on Silicon Surfaces from Solvents

Bearda, Twan, Vander Mot, Ief, Van den Broeck, Kristel, Van Hoornick, Nausikaä, Van Hoeymissen, Jan, Mertens, Paul W.

Journal:

Solid State Phenomena

Year:

2005

Language:

english

File:

PDF, 208 KB

english, 2005

61

Application of UV/VIS-Spectroscopy for Determination of Complexing Agent Stability in APM and Like Mixtures Thereof

Doll, O., Kolbesen, Bernd O.

Journal:

Solid State Phenomena

Year:

2005

Language:

english

File:

PDF, 269 KB

english, 2005

62

Adhesion and Removal of Alumina Slurry Particles on Wafer Surfaces in Cu CMP

Hong, Yi Koan, Han, Ja Hyung, Lee, Jin Hyung, Park, Jin Goo, Busnaina, Ahmed A.

Journal:

Solid State Phenomena

Year:

2005

Language:

english

File:

PDF, 518 KB

english, 2005

63

Deposition Behavior of Volatile Acidic Contaminants on Metallic Interconnect Surfaces

Fontaine, Hervé, Veillerot, Marc, Danel, Adrien

Journal:

Solid State Phenomena

Year:

2005

Language:

english

File:

PDF, 273 KB

english, 2005

64

Inspection Challenges at the 45nm Technology Node

Shortt, David, Cheung, Lisa

Journal:

Solid State Phenomena

Year:

2005

Language:

english

File:

PDF, 392 KB

english, 2005

65

New Post Etch Polymer Removal Process for Al-Interconnects and Vias in Tank and Spray Tools Using a New Inorganic Chemistry

Mellies, Raimund, Kunz, Stefan, Nilius, Franz, Mayer, Dieter, Kühner, Andreas

Journal:

Solid State Phenomena

Year:

2005

Language:

english

File:

PDF, 1.43 MB

english, 2005

66

Further Reduction of Trace Level Ion from Ultra Pure Water and Its Effect on Electrical Property of Device

Umeda, Toru, Tsuzuki, Shuichi, Kokuun, Ryouji, Yoneda, Kazuko

Journal:

Solid State Phenomena

Year:

2005

Language:

english

File:

PDF, 385 KB

english, 2005

67

Wafer Backside Cleaning Strategies for High-k/Metal Gate Processing

Vos, Rita, Kesters, E., Garaud, Sylvain, De Waele, R., Kenis, Karine, Lux, Marcel, Kraus, H., Snow, James, Shamiryan, D., Catana, Gabriela, Deweerd, W., Schram, T., DeGendt, S., Mertens, Paul W.

Journal:

Solid State Phenomena

Year:

2005

Language:

english

File:

PDF, 368 KB

english, 2005

68

Using Megasonics for Particle and Residue Removal in Single Wafer Cleaning

Verhaverbeke, Steven, Gouk, Roman, Yost, Dennis

Journal:

Solid State Phenomena

Year:

2005

Language:

english

File:

PDF, 286 KB

english, 2005

69

Resist Stripping for Advanced FEOL Nodes: Improvements to Process Based on Ozone Diffusion by Use of Additives

Louveau, Olivier, Lajoinie, Emile, Pollet, Olivier, Odet, Jean Philippe, Cêtre, Sylviane, Lachal, Laurent, Icard, Béatrice, Tabouret, Evelyne, Veillerot, Marc, Fontaine, Hervé, Louis, Didier

Journal:

Solid State Phenomena

Year:

2005

Language:

english

File:

PDF, 689 KB

english, 2005

70

On the Application of a Thin Ozone Based Wet Chemical Oxide as an Interface for ALD High-k Deposition

Onsia, Bart, Caymax, Matty, Conard, Thierry, De Gendt, Stefan, De Smedt, F., Delabie, A., Gottschalk, C., Heyns, Marc M., Green, M., Lin, S., Mertens, Paul W., Tsai, W., Vinckier, Chris

Journal:

Solid State Phenomena

Year:

2005

Language:

english

File:

PDF, 318 KB

english, 2005

71

The Degradation Prevention of Resin Materials for Semiconductor Manufacturing Equipment by Applying the Ultra-High Purity Gas Supply Technology

Hidaka, Atsushi, Yamashita, Satoru, Tanahashi, Naoki, Ishii, Hidekazu, Kitano, Masafumi, Shirai, Yasuyuki, Ohmi, Tadahiro

Journal:

Solid State Phenomena

Year:

2005

Language:

english

File:

PDF, 408 KB

english, 2005

72

Interface State Densities and Surface Charge on Wet-Chemically Prepared Si(100) Surfaces

Journal:

Solid State Phenomena

Year:

2005

Language:

english

File:

PDF, 326 KB

english, 2005

73

Laser Cleaning of Particles from Silicon Wafers: Capabilities and Mechanisms

Graf, Johannes, Lang, F., Mosbacher, M., Leiderer, P.

Journal:

Solid State Phenomena

Year:

2005

Language:

english

File:

PDF, 456 KB

english, 2005

74

Qualification of Resist Strip Process for Ultra Low-k/Cu Interconnect

Xu, Han, Shen, Amy, Tarasov, Vlad, White, Brian, Wolf, Josh

Journal:

Solid State Phenomena

Year:

2005

Language:

english

File:

PDF, 446 KB

english, 2005

75

Megasonics: A Cavitation Driven Process

Holsteyns, Frank, Lee, Kun Tack, Graf, Sabine, Palmans, Roger, Vereecke, Guy, Mertens, Paul W.

Journal:

Solid State Phenomena

Year:

2005

Language:

english

File:

PDF, 568 KB

english, 2005

76

Chemical Additive Formulations for Particle Removal in SCCO2-Based Cleaning

Korzenski, M.B., Bernhard, D.D., Baum, T.H., Saga, Koichiro, Kuniyasu, Hitoshi, Hattori, Takeshi

Journal:

Solid State Phenomena

Year:

2005

Language:

english

File:

PDF, 438 KB

english, 2005

77

Particle Adhesion on Tool Kit Part: Case Study for Ceramic Material

Blanc, S., Préauchat, B., Veillerot, Marc

Journal:

Solid State Phenomena

Year:

2005

Language:

english

File:

PDF, 503 KB

english, 2005

78

Effect of Chemical Solution on the Stability of Low-k Films

Kesters, E., Le, Quoc Toan, Baklanov, Mikhail R., Boullart, Werner, Mertens, Paul W.

Journal:

Solid State Phenomena

Year:

2005

Language:

english

File:

PDF, 290 KB

english, 2005

79

Influences of Oxide Loss on Contamination Removal

Eitoku, Atsuro, Snow, James, Vos, Rita, Kenis, Karine, Mertens, Paul W.

Journal:

Solid State Phenomena

Year:

2005

Language:

english

File:

PDF, 302 KB

english, 2005

80

Measurement and Control of Airborne Molecular Contamination during Wafer Storage and Transport

Alvarez, Daniel, Tram, Allan, Holmes, Russell J.

Journal:

Solid State Phenomena

Year:

2005

Language:

english

File:

PDF, 263 KB

english, 2005

81

Investigation of Dissolution and Electrodeposition of Copper in Concentrated and Diluted Oxalic Acid Media in Post-CMP Cleaning

Gabrielli, C., Mace, C., Matha, J., Mège, S., Ostermann, E., Perrot, H.

Journal:

Solid State Phenomena

Year:

2005

Language:

english

File:

PDF, 382 KB

english, 2005

82

Performance of a Linear Single Wafer IPA Vapour Based Drying System

Fyen, Wim, Arnauts, Sophia, Holsteyns, Frank, Doumen, G., Vereecke, Guy, Van Steenbergen, Jan, Mertens, Paul W.

Journal:

Solid State Phenomena

Year:

2005

Language:

english

File:

PDF, 338 KB

english, 2005

83

Metrology and Removal of Nanoparticles from 500 Micron Deep Trenches

Guldiken, O., Bakhtari, K., Busnaina, Ahmed A., Park, J.

Journal:

Solid State Phenomena

Year:

2005

Language:

english

File:

PDF, 366 KB

english, 2005

84

Contaminants Removal from Epi Substrates Using Vapor-Laser Process

Wachs, A., Zeid, S., Uziel, Y., Huber, W., Krueger, J.

Journal:

Solid State Phenomena

Year:

2005

Language:

english

File:

PDF, 230 KB

english, 2005

85

Occurrence of Arsenic-Based Defects and Techniques for Their Elimination

Goh, Felicia, Lim, Christopher, Sih, Vincent, Ismail, Zainab, Chooi, Simon Y.M.

Journal:

Solid State Phenomena

Year:

2005

Language:

english

File:

PDF, 633 KB

english, 2005

86

Non-Contact Cleaning Process for Post-CMP Copper

Koos, Daniel A., Svirchevski, Julia, Vitkavage, Daniel J., Hansen, David G., Reinhardt, Karen A., Huang, Frank, Mitchel, Marie, Zhang, Guang Ying

Journal:

Solid State Phenomena

Year:

2005

Language:

english

File:

PDF, 253 KB

english, 2005

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