Channel mobility degradation and charge trapping in high-k/metal gate NMOSFETs
Shajan Mathew, L.K. Bera, N. Balasubramanian, M.S. Joo, B.J. ChoVolume:
462-463
Year:
2004
Language:
english
Pages:
4
DOI:
10.1016/j.tsf.2004.05.017
File:
PDF, 184 KB
english, 2004