Volume 462-463; Issue none

Thin Solid Films

Volume 462-463; Issue none
2

ALD (HfO2)x(Al2O3)1−x high-k gate dielectrics for advanced MOS devices application

Year:
2004
Language:
english
File:
PDF, 522 KB
english, 2004
4

Effect of substrate on phase transformation kinetics of WSix films

Year:
2004
Language:
english
File:
PDF, 410 KB
english, 2004
9

Deep trench etch and clean process technology for CU/SiOC passive device

Year:
2004
Language:
english
File:
PDF, 256 KB
english, 2004
20

Interface and oxide traps in high-κ hafnium oxide films

Year:
2004
Language:
english
File:
PDF, 293 KB
english, 2004
24

Low cycle fatigue models for lead-free solders

Year:
2004
Language:
english
File:
PDF, 315 KB
english, 2004
26

Metal gate technology for nanoscale transistors—material selection and process integration issues

Year:
2004
Language:
english
File:
PDF, 705 KB
english, 2004
28

Oxidation of bulk Au–Al intermetallics

Year:
2004
Language:
english
File:
PDF, 462 KB
english, 2004
30

Bonding structures of silicon oxynitride prepared by oxidation of Si-rich silicon nitride

Year:
2004
Language:
english
File:
PDF, 240 KB
english, 2004
31

Challenges of pattern transfer for ultra-low-k OSG film Aurora™ULK

Year:
2004
Language:
english
File:
PDF, 323 KB
english, 2004
36

Static and cyclic relaxation studies in nonconductive adhesives

Year:
2004
Language:
english
File:
PDF, 870 KB
english, 2004
38

Study of leakage mechanisms of the copper/Black Diamond™ damascene process

Year:
2004
Language:
english
File:
PDF, 236 KB
english, 2004
41

Overcoming intrinsic weakness of ULSI metallization electromigration performances

Year:
2004
Language:
english
File:
PDF, 850 KB
english, 2004
43

Study of interactions between α-Ta films and SiO2 under rapid thermal annealing

Year:
2004
Language:
english
File:
PDF, 246 KB
english, 2004
44

Thermal stability of Cu/α-Ta/SiO2/Si structures

Year:
2004
Language:
english
File:
PDF, 141 KB
english, 2004
47

Finite element analysis for microwave cure of underfill in flip chip packaging

Year:
2004
Language:
english
File:
PDF, 443 KB
english, 2004
49

Interfacial reaction between Sn-rich solders and Ni-based metallization

Year:
2004
Language:
english
File:
PDF, 1.13 MB
english, 2004
50

Influence of Sb on IMC growth in Sn–Ag–Cu–Sb Pb-free solder joints in reflow process

Year:
2004
Language:
english
File:
PDF, 837 KB
english, 2004
53

Thermal, electrical, and mechanical properties of layered substrates for microelectronic applications

Year:
2004
Language:
english
File:
PDF, 235 KB
english, 2004
54

Glass-to-glass anodic bonding process and electrostatic force

Year:
2004
Language:
english
File:
PDF, 269 KB
english, 2004
55

Microstructural characterization of low dielectric silica xerogel film

Year:
2004
Language:
english
File:
PDF, 381 KB
english, 2004
59

Effects of Cu diffusion behaviors on electronic property of Cu/Ta/SiO2/Si structure

Year:
2004
Language:
english
File:
PDF, 508 KB
english, 2004
61

Preparation of LaNiO3 thin films by mist plasma evaporation

Year:
2004
Language:
english
File:
PDF, 297 KB
english, 2004
63

EMC characterization and process study for electronics packaging

Year:
2004
Language:
english
File:
PDF, 431 KB
english, 2004
67

Influence of bonding parameters on electrostatic force in anodic wafer bonding

Year:
2004
Language:
english
File:
PDF, 1.75 MB
english, 2004
68

Adhesion studies of low-k silsesquioxane

Year:
2004
Language:
english
File:
PDF, 476 KB
english, 2004
75

Effect of ramp rate on dielectric breakdown in CU–SiOC interconnects

Year:
2004
Language:
english
File:
PDF, 407 KB
english, 2004
76

Ni(Pt) alloy silicidation on (100) Si and poly-silicon lines

Year:
2004
Language:
english
File:
PDF, 1.26 MB
english, 2004
77

Characterization of the junction leakage of Ti-capped Ni-silicided junctions

Year:
2004
Language:
english
File:
PDF, 925 KB
english, 2004
78

The use of electroless copper seed in electrochemical deposited copper interconnect

Year:
2004
Language:
english
File:
PDF, 202 KB
english, 2004
79

Barrier layer effects on reliabilities of copper metallization

Year:
2004
Language:
english
File:
PDF, 319 KB
english, 2004
80

Study of copper diffusion into Ta and TaN barrier materials for MOS devices

Year:
2004
Language:
english
File:
PDF, 342 KB
english, 2004
82

Thermal performance of a phase change material on a nickel-plated surface

Year:
2004
Language:
english
File:
PDF, 536 KB
english, 2004
84

Critical study of thermosonic copper ball bonding

Year:
2004
Language:
english
File:
PDF, 614 KB
english, 2004
87

Material and design considerations of FBGA reliability performance

Year:
2004
Language:
english
File:
PDF, 1.27 MB
english, 2004
88

Chemical mechanical polishing of copper layer employing MnO2 slurry

Year:
2004
Language:
english
File:
PDF, 319 KB
english, 2004
90

STEM study of interfacial reaction at HfxAl1−xOy/Si interfaces

Year:
2004
Language:
english
File:
PDF, 316 KB
english, 2004
91

Empirical equations for moisture absorption of a rigid substrate

Year:
2004
Language:
english
File:
PDF, 632 KB
english, 2004
92

Author Index of Volumes 462–463

Year:
2004
File:
PDF, 42 KB
2004
93

Editorial Board

Year:
2004
Language:
english
File:
PDF, 22 KB
english, 2004
94

Subject Index of Volumes 462–463

Year:
2004
Language:
english
File:
PDF, 91 KB
english, 2004