![](/img/cover-not-exists.png)
The impact of etch-stop layer for borderless contacts on deep submicron CMOS device performance—a comparative study
H. Liao, P.S. Lee, L.N.L. Goh, H. Liu, J.L. Sudijono, Q. Elgin, C. SanfordVolume:
462-463
Year:
2004
Language:
english
Pages:
5
DOI:
10.1016/j.tsf.2004.05.035
File:
PDF, 448 KB
english, 2004