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Investigation of copper contamination into interlayer dielectrics by copper process
Ichiro Kobayashi, Tomoe Miyazawa, Masayo Fujimoto, Hiroko Kawaguchi, Tohru HaraVolume:
462-463
Year:
2004
Language:
english
Pages:
4
DOI:
10.1016/j.tsf.2004.05.040
File:
PDF, 158 KB
english, 2004