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Investigation of deposition temperature effect on properties of PECVD SiOCH low-k films
T.K.S. Wong, B. Liu, B. Narayanan, V. Ligatchev, R. KumarVolume:
462-463
Year:
2004
Language:
english
Pages:
5
DOI:
10.1016/j.tsf.2004.05.048
File:
PDF, 322 KB
english, 2004