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Impact of barrier metal on electrical performance of Cu/low K (Black Diamond™) in 0.13μm dual damascene interconnection
H.Y. Li, C.Y. Li, Y.J. Su, C.F. TsangVolume:
462-463
Year:
2004
Language:
english
Pages:
5
DOI:
10.1016/j.tsf.2004.05.052
File:
PDF, 568 KB
english, 2004