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Comparative studies of physical and chemical properties of plasma-treated CVD low k SiOCH dielectrics
C.F. Tsang, Y.J. Su, V.N. BliznetsovVolume:
462-463
Year:
2004
Language:
english
Pages:
6
DOI:
10.1016/j.tsf.2004.05.055
File:
PDF, 382 KB
english, 2004