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Study of interactions between α-Ta films and SiO2 under rapid thermal annealing
Z.L. Yuan, D.H. Zhang, C.Y. Li, K. Prasad, C.M. TanVolume:
462-463
Year:
2004
Language:
english
Pages:
5
DOI:
10.1016/j.tsf.2004.05.056
File:
PDF, 246 KB
english, 2004