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Effects of Cu diffusion behaviors on electronic property of Cu/Ta/SiO2/Si structure
S. Li, H.S. Park, M.H. Liang, T.H. Yip, O. PrabhakarVolume:
462-463
Year:
2004
Language:
english
Pages:
5
DOI:
10.1016/j.tsf.2004.05.072
File:
PDF, 508 KB
english, 2004