Low dielectric constant films prepared by plasma-enhanced...

Low dielectric constant films prepared by plasma-enhanced chemical vapor deposition from trimethylsilane

M.R. Wang, Rusli, M.B. Yu, N. Babu, C.Y. Li, K. Rakesh
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Volume:
462-463
Year:
2004
Language:
english
Pages:
4
DOI:
10.1016/j.tsf.2004.05.081
File:
PDF, 390 KB
english, 2004
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