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Feasibility study of using thin aluminum nitride film as a buffer layer for dual metal gate process
Chang Seo Park, Byung Jin Cho, N. Balasubramanian, Dim-Lee KwongVolume:
462-463
Year:
2004
Language:
english
Pages:
4
DOI:
10.1016/j.tsf.2004.05.083
File:
PDF, 459 KB
english, 2004