STEM study of interfacial reaction at HfxAl1−xOy/Si...

STEM study of interfacial reaction at HfxAl1−xOy/Si interfaces

J.Y. Dai, K. Li, P.F. Lee, X. Zhao, S. Redkar
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Volume:
462-463
Year:
2004
Language:
english
Pages:
4
DOI:
10.1016/j.tsf.2004.05.139
File:
PDF, 316 KB
english, 2004
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