Characteristics of selective epitaxial SiGe deposition...

Thin Solid Films 2006 Vol. 508; Iss. 1-2

Characteristics of selective epitaxial SiGe deposition processes for recessed source/drain applications

Roger Loo, Peter Verheyen, Geert Eneman, Rita Rooyackers, Frederik Leys, Denis Shamiryan, Kristin De Meyer, Philippe P. Absil, Matty Caymax
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Volume:
508
Year:
2006
Language:
english
Pages:
4
DOI:
10.1016/j.tsf.2005.06.108
File:
PDF, 221 KB
english, 2006
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