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Surface reaction and B atom segregation in ECR chlorine plasma etching of B-doped Si1−xGex epitaxial films
Hang-Sup Cho, Masao Sakuraba, Junichi MurotaVolume:
508
Year:
2006
Language:
english
Pages:
4
DOI:
10.1016/j.tsf.2005.06.116
File:
PDF, 172 KB
english, 2006